Arkema Inc.

Atofina Chemicals, Inc.

Other

Arkema France

Martin Nosowitz

Nicholas Michael Martyak

Jianfeng Lou

Gary S Smith

Patrick Kendall Janney

Michael D Gernon

Michael S Mendolia

Peter A Callais

Glenn Carroll

Barbara L Stainbrook

Kenneth M Malone

Christian Bonardi

Thomas S Buszta

Jean-Marie Ollivier

Richard Peres

Pierre Hebrard

Kenneth Malone

Michael Mendolia

Peter Callais

Barbara Stainbrook

Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.

High purity electrolytic sulfonic acid solutions

Disclosed are aqueous solutions for use in high energy, highly efficient electrical energy storage devices. The solutions contain (a) a high purity sulfonic acid with a low concentration of low valent sulfur compounds or higher valent sulfur compounds susceptible to reduction, (b) a metal or metals in an oxidized state that are capable of being reduced to the zero valent oxidation state, (c) a metal that is in an oxidized state that is incapable of being reduced to its metallic state and (d) optionally, a buffering agent and/or conductivity salts.

Zinc lanthanide sulfonic acid electrolytes

A family of slurries are disclosed which are useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers. The slurries of the invention are comprised of a liquid carrier; a sulfur-bearing compounds capable of converting copper to copper sulfide; optionally, abrasive particles (polishing agent; optionally a chelating agent; optionally a buffering agent; optionally, a stopping compound; optionally, other additives; and optionally, a co-solvent. The method of the invention comprises the steps of: a) providing a wafer comprising a first material having a surface etched to form a pattern and a second material deposited over the surface of the first material; b) contacting the second material of the wafer with abrasive in the presence of the working slurry; and c) relatively moving the wafer or polishing pad or both while the second material is in contact with the slurry and abrasive particles until an exposed surface of the wafer is planar and comprises at least one area of exposed first material and one area of exposed second material.

Composition and method for copper chemical mechanical planarization

Vinyl monomers are stabilized by a composition which includes an alkyl hydroxyl amine and a sulfide compound or at least two alkyl hydroxyl amines and a phenolic compound.

Stabilization of monomers by compositions based on alkylhydroxylamines

Disclosed are compositions for shortstopping free radical emulsion polymerizations and stabilizing polymers produced from the corresponding emulsion processes. Such compositions include at least one hydrophillic radical scavenger (i.e, shortstopper) and at least one hydrophobic radical scavenger. The compositions are preferably targeted for applications in the emulsion processes of rubber latexes. These compositions exhibit excellent performance not only as shortstoppers of free radical emulsion polymerizations but also as stabilizers of the corresponding polymers. Thus, the compositions prevent additional polymerization in the particles without requiring additional stabilizer even after such polymers are steam stripped. They do so without the use of chemicals which carry a high safety, health, or environmental risk.

Compositions for shortstopping free radical emulsion polymerizations and stabilizing latices made therefrom

In the process according to the invention for the aqueous suspension polymerization of vinyl chloride, alone or as a mixture with another vinyl monomer, the polymerization initiator comprises at least one compound chosen from dialkyl peroxydicarbonates, peroxy-tert-alkanoates and diacyl peroxides and use is made, as agent for halting the polymerization, of a mono- or disubstituted hydroxylamine. The resins thus obtained exhibit improved color and heat stability.

Process of polymerizing vinyl chloride with hydroxylamines

A procedure for the generation of organosulfonic acids from solutions of corresponding metal organosulfonate compounds by electrowinning, electrolytically driven hydrolysis or chemically driven hydrolysis is described. Appropriate organosulfonate compounds include the water soluble salts of alkanesulfonic and aromatic sulfonic acids which incorporate metals from Group VIB, VIIB, VIIIB, IB, IIB or VA of the periodic table. The electrowinning and electrolytic techniques described can be applied in divided or undivided cells and can be operated in continuous fashion to provide the greatest efficiency. Hydrolysis based methods can employ either anodic oxidation or oxidation both of which function to oxidize the metal cation(s) present to hydrolytically unstable higher oxidation states.

Generation of organosulfonic acid from its salts

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Paoli, PA, United States of America

Martin Nosowitz