Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Martin Mahlmann

Johannes Rau

Jens Kugler

Bernhard Gellrich

Bernhard Geuppert

Armin Schoeppach

Thomas Petasch

Gerhard Fuerter

Jochen Weber

Thorsten Rassel

Erich Merz

Benjamin Sigel

Andreas Bertele

Peter Kloesch

Gerhard Fürter

Armin SCHÖPPACH

An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. The second optical element module is located adjacent to the first optical element module and includes a second optical element which defines a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is laterally offset and/or inclined with respect to the first housing axis. The first housing axis is substantially collinear with the second optical axis.

Optical projection system

An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.

The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Projection exposure apparatus for semiconductor lithography including an actuator system

An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.

An optical imaging device () has at least one optical element () which is provided with an outer frame (), an inner ring () in which the optical element () is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring () to the outer frame () is provided in at least one degree of freedom by means of a support () arranged between the inner ring () and the outer frame (). The manipulator instrument has at least one actuator (), the setting forces and/or bearing forces of which act contactlessly on the inner ring (), for mounting and/or positioning and/or manipulating the inner ring () relative to the outer frame ().

Optical imaging device

A flange assembly of an optical system has a first flange, a compensation element and a second flange. The flanges and the compensation element are substantially axially symmetric both flanges (') being suitable for being connected to other components of the optical system in a non-destructive, non-positive axially separable fashion. The two flanges consist of different materials with different coefficients of linear thermal expansion. The compensation element is radially soft, but connects the two flanges rigidly in their relative spatial position.

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Heidenheim, Germany

Martin Mahlmann