Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Trumpf Werkzeugmaschinen Gmbh + Co. Kg

Trumpf Laser- Und Systemtechnik Gmbh

Asml Netherlands B.v.

Trumpf Gmbh & Company

Trumpf Lasersystems for Semiconductor Manufacturing Se

Martin Lambert

Tolga Ergin

Derk Jan Wilfred Klunder

Ruud Antonius Catharina Maria Beerens

Robert A Bergstedt

Juergen-Michael Weick

Joachim Schulz

Philipp Herwerth

Frank B Sperling

Uwe Mienhardt

Andreas Enzmann

Jason Michael Arcand

Andrey Sergeevich Tychkov

Stefan Michael Bruno Bäumer

Jürgen-Michael Weick

Stefan Piehler

Oliver Schlosser

Thomas Schwarzbaeck

Andreas Kristian Hopf

Manisha Ranjan

Jasper Witte

Jiayue Yuan

Nico Johannes Antonius Hubertus Boonen

Boris Regaard

Jürgen-Michael Welck

Christopher P Pate

Thomas SCHWARZBÄCK

An extreme ultraviolet (EUV) light source includes a providing device for providing a target material, a pulsed laser source for emitting a pulsed laser beam, and a beam guidance device for supplying the pulsed laser beam from the pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the pulsed laser beam. The target material is configured to emit EUV radiation on account of the irradiation. The beam guidance device includes a beam positioning device comprising four mirrors as two mirror pairs for positioning the pulsed laser beam. Each of the four mirrors is rotatable about exactly one axis of rotation. The axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction. The axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.

EUV light source with a beam positioning device

A laser focusing system () for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror () configured to receive a laser beam from a beam delivery system () and generate a first reflected laser beam (); •—a second curved mirror () configured to receive the first reflected laser beam () and generate a second reflected laser beam (), wherein the laser focusing system () is configured to focus the second reflected laser beam () to a target location () in a vessel () of the EUV radiation source ().

Laser focussing module

A focusing device for focusing a laser beam in a target area. The focusing device includes a paraboloid mirror configured to widen the laser beam; an ellipsoid mirror or a hyperboloid mirror configured to focus the widened laser beam at a focal position within the target area; and a movement device. The movement device is configured to move the ellipsoid mirror or the hyperboloid mirror relative to the paraboloid mirror, or together with the paraboloid mirror, to change the focal position within the target area.

Focusing device and EUV radiation generating device having same

A reflective optical element includes a first, inner surface region for reflecting a first inner beam portion of a light beam impinging on the reflective optical element in order to form a first reflected light beam, and at least one second, outer surface region for reflecting at least one second outer beam portion of the impinging light beam for forming at least one second reflected light beam. The second surface region is designed to reduce a beam cross section of the second reflected light beam by comparison to the first reflected light beam such that the second reflected light beam extends along a superposition length completely within the first reflected light beam. In addition a beam guiding device has at least one such reflective optical element and an EUV-beam generating device has such a beam guiding device.

Reflective optical element, beam guiding device and EUV-beam generating device

Beam guiding devices for guiding a laser beam, in particular in a direction towards a target region for producing extreme ultraviolet (EUV) radiation, include an adjustment device for adjusting a beam diameter and an aperture angle of the laser beam. The adjustment device includes a first mirror having a first curved reflecting surface, a second mirror having a second curved reflecting surface, a third mirror having a third curved reflecting surface, a fourth mirror having a fourth curved reflecting surface, and a movement device configured to adjust the beam diameter and the aperture angle of the laser beam by moving the first reflecting surface and the fourth reflecting surface relative to one another and, independently thereof, moving the second reflecting surface and the third reflecting surface together relative to the first reflecting surface and the fourth reflecting surface.

Adjusting a beam diameter and an aperture angle of a laser beam

The disclosure relates to a beam trap including: a reflector for reflecting a beam, in particular a laser beam, that is incident on a surface of the reflector, and an absorber device for absorbing the beam reflected at the surface of the reflector. The surface of the reflector is segmented and has a plurality of reflector regions that are configured for reflecting a respective partial beam of the incident beam into an absorber region of the absorber device that is associated with the respective reflector region. The disclosure also relates to a beam guide device having a beam trap of this type, an EUV radiation generation apparatus having a beam guide device of this type, and an associated method for absorbing a beam, in particular for absorbing a laser beam.

Beam trap, beam guide device, EUV radiation generating apparatus, and method for absorbing a beam

An extreme ultraviolet radiation generating device includes a source operable to generate a first and second entrance beam, and a beam unit operable to modify at least one of a direction and a beam divergence of the first and second entrance beam, in which the beam unit includes: a beam splitter to receive the first and second entrance beam, the beam splitter being configured to reflect the first entrance beam as a first exit beam and to transmit the second entrance beam; and a mirror in the beam path of the transmitted, second entrance beam to reflect the second entrance beam to form a second exit beam that is transmitted by the beam splitter and that is at least partially superposed on the first exit beam, in which the beam unit is configured to modify an angle and/or beam divergence between the first and second exit beam.

EUV radiation generating device including a beam influencing optical unit

In one implementation, a beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber further includes a first opening for receiving into the vacuum chamber a first laser beam and a second opening for receiving into the vacuum chamber a second laser beam. The vacuum chamber also includes a superposition apparatus arranged to superpose the first laser beam having a first wavelength and a second laser beam having a second wavelength for common beam guidance in the direction of the target region. The vacuum chamber also includes a beam shaping apparatus arranged upstream of the superposition apparatus in the beam path of the second laser beam, wherein the beam shaping apparatus is configured to set a ring-shaped beam profile of the second laser beam, The first and second laser beam have different wavelengths.

Beam guiding apparatus

The invention relates to an optical arrangement comprising an optical module having a first carrier body to which there are attached at least one optical element and a plurality of first mounting elements, and a housing having a second carrier body for at least one further optical element, wherein a plurality of second mounting elements is attached to the carrier body. Also comprised is a movement device for displacing the first carrier body relative to the second carrier body in a movement direction between a removal position from which the optical module can be removed from the housing and a mounting position in which the movement device presses the first mounting elements against the second mounting elements. The invention relates also to an optical module and to a method for correctly positioning an optical module in a housing.

Optical arrangement, optical module, and method for correctly positioning an optical module in a housing

An Extreme Ultra-Violet (EUV) excitation light source has a beam guide device for manipulating at least one laser beam is provided. The beam guide device comprises at least one beam splitter for generating at least two separated beams from at least one laser beam, at least one mirror or a lens for manipulating at least one of the separated beams, a superposition mirror for superposing the at least two separated beams, and a focusing appliance for generating a respective focus for each of the at least two separated beams. At least two focuses can be generated at one identical location or at two different locations by the beam guide device.

EUV excitation light source with a laser beam source and a beam guide device for manipulating the laser beam

Beam guides for guiding a laser beam from a driver laser device in the direction of a target position for generating extreme ultraviolet ('EUV') radiation are disclosed. The beam guides include a device for increasing or decreasing the beam diameter of the laser beam. The device includes a first off-axis parabolic mirror having a first convex curved reflecting surface and a second off-axis parabolic mirror having a second concave curved reflecting surface. The beam guides also include a moving device arranged to change a distance between the first and the second reflecting surfaces to change the opening angle (&#x3b1;), e.g., the convergence or divergence angle, of the laser beam. Methods for adjusting an opening angle (&#x3b1;) of a laser beam using such beam guides are also disclosed.

Beam guide and method for adjusting the opening angle of a laser beam

The invention relates to extreme ultraviolet 'EUV' radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.

EUV radiation generating apparatus and operating methods

A laser processing machine head, a laser processing machine head monitoring system, and a method of monitoring an optical element of a laser processing machine feature a light-transmissive optical element and an optical element holder defining a cavity in which the optical element is retained against rotation. A light source mounted to the holder directs a beam of light into the optical element through a peripheral surface of the optical element. A light receiver is responsive to light from the light source reflected through the optical element. Monitoring a signal from the light receiver allows a status of the optical element to be assessed.

Laser machine monitoring

A device for a laser processing head includes an optical element configured for attachment to the laser processing head, a housing for the laser processing head configured to receive the optical element, and a mechanical encoding disposed on at least one of the optical element and the housing to permit installation of a predetermined optical element at a predetermined orientation into the housing.

Growing community of inventors

Korb, Germany

Martin Lambert