Freescale Semiconductor,inc.

Synopsys, Inc.

Martin L Niset

Andrew Edward Horch

Derek Beattie

Yanyi Liu Wong

Agustinus Sutandi

Craig A Cavins

Alistair James Gorman

Laureen H Parker

Troy Nathan Gilliland

Andrew W Hardell

Ting-Jia Hu

Rebecca Shiu Yun Cheng

Andrew E Birnie

Ross Peterson

Stephen McGinty

Vikramaditya Kundur

Mads Hommelgaard

Derek J Beattie

Stephen Mcginty

An OTP memory device includes a first and a second doped region of the same polarity in a semiconductor substrate. The second doped region has a higher doping concentration than the first doped region. A source region and a drain region of an opposite polarity are also in the semiconductor substrate. The source is positioned over the lower doped region, and the drain is positioned over the higher doped region. A plurality of anti-fuse devices, separated from each other by a portion of the lower doped region, are each positioned at least partially above a respective portion of the source region (and, in turn, above the lower doped region). A first metal line is coupled to a first subset of the anti-fuse devices, and a second metal line is coupled to a different, second subset of the anti-fuse devices arranged between the anti-fuses in the first subset.

One-time programmable bitcell with native anti-fuse

A solid-state non-volatile memory (NVM) device includes a memory bit cell. The memory bit cell includes a field effect transistor (FET) fabricated on a substrate and having a floating gate. The floating gate includes a thick oxide layer. The FET includes drain and source, each fabricated within the substrate and coupled to the floating gate and a channel region with native doping. The drain is fabricated to have a halo region. A method for fabricating a solid-state NVM device includes fabricating solid state device including NVM bit cell which provides multiple storage and includes an FET on substrate. The method also includes fabricating floating gate of the FET including thick gate oxide layer, and fabricating drain and source of FET within the substrate, drain and source coupled to the floating gate and channel region with native doping. Further, the method includes fabricating halo region within the substrate at the drain.

Floating gate non-volatile memory bit cell

Methods and systems for storing data are disclosed. The systems are configured to perform the methods and the methods may include, for example, receiving electronic data to be stored, partitioning the data into multiple segments, and storing each segment in a memory during a separate write cycle. The methods may also include programming a compensation load so that power provided by a power supply during the storing of each segment is substantially the same.

Memory power supply load management

A method for programming/erasing a non-volatile memory (NVM) includes performing a program/erase operation on a portion of the NVM using a first set of parameters. The method further includes determining whether each cell in the portion of the NVM passes a first margin level, if not determining which one of a set of lower margin levels than the first margin level each cell in the portion of the NVM passes. The method further includes modifying at least one of the set of parameters associated with a subsequent program/erase operation for the portion of the NVM based on the determined one of the set of lower margin levels.

Non-volatile memory with controlled program/erase

A method for programming a non-volatile memory (NVM) cell includes applying an increasing voltage to the current electrode that is used as a source during a read. The initial programming source voltage results in a relatively small number of electrons being injected into the storage layer. Because of the relatively low initial voltage level, the vertical field across the gate dielectric is reduced. The subsequent elevation of the source voltage does not raise the vertical field significantly due to the electrons in the storage layer establishing a field that reduces the vertical field. With less damage to the gate dielectric during programming, the endurance of the NVM cell is improved.

Nonvolatile memory cell programming

A non-volatile memory (NVM) that can be optimized for data retention or endurance is divided into portions that are optimized for one or the other or potentially some other storage characteristic. For the portion allotted for data retention, the memory cells are erased to a relatively greater extent. For the portion allotted for high endurance, the memory cells are erased to a relatively lesser extent. This is conveniently achieved by simply raising the level of the current reference that is used to determine if a cell has been sufficiently erased for the high data retention cells. The higher endurance cells thus will typically receive fewer erase pulses than the memory cells for high data retention. The reduced erasing requirement for the high endurance cells results in overall faster erasing and less stress on the high endurance cells as well as on the circuitry that generates the high erase voltages.

Method and apparatus for programming/erasing a non-volatile memory

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Martin L Niset