Flint Group Germany Gmbh

Xsys Prepress Nv

Heraeus Epurio LLC

Heraeus Deutschland Gmbh & Co Kg

Heraeus Nexensos Gmbh

Martin Kunz

Karlheinz Wienand

Stefan Dietmann

Tim Asmus

Yongqiang Zhang

Ram B Sharma

Peter Fronczkiewicz

Eva Freudenthaler

Torben Wendland

Andrew Knapp

Alexander Elsen

Bart Wattyn

Darin Campo

Tim Protzmann

An apparatus for generating a relief carrier using a solidifiable material includes a support structure configured for providing a substantially cylindrical support surface. The support surface may be formed by a substrate intended to be part of the relief carrier to be generated or by a cylindrical support not intended to be part of the relief carrier to be generated. A container is provided for the solidifiable material, the container having a wall arranged substantially parallel to an axis of the support structure; a moving means to move the support structure relative to the wall such that subsequent areas of the support surface face the wall during the moving. Moving includes at least a rotation around the axis. An irradiating means sends irradiation, through the wall in a predetermined area between the support surface and the wall.

Apparatus and method for generating a relief carrier by irradiation

A method of thermal development of flexographic printing elements, having steps of: fixing a relief precursor a movable support; repeatedly moving the support in a multitude of movement cycles; heating the relief precursor to a temperature sufficient to cause the uncured portions of the photopolymer layer to soften or liquefy; contacting with a development medium; Single movement cycles are carried out with different heating powers and different contacting with the developing medium such that one may improve the registration accuracy of the printing element, ease removal of functional layers, smoothen the relief plate precursor surface, and address heat build-up problem.

Method for thermally developing relief precursors

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Sulfonic acid derivative compounds as photoacid generators in resist applications

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Waldbronn, Germany

Martin Kunz