Oerlikon Surface Solutions Ag, Pfaffikon

Oc Oerlikon Balzers Ag

Martin Kaspar

Johannes Edlinger

Claus Heine-Kempkens

Max Wiki

Bernd Maisenhoelder

Heidi Thome-Forster

Carlos Ribeiro

Ruediger Schaefer

Jörg Kraus

Tasso Karsch

Rüdiger Schäfer

Heidi Thome-Foerster

Joerg Kraus

A component, the surface of which is at least partially covered with a coating, wherein the coating comprises a PVD coating arranged between a first paint layer and a second paint layer and the first paint layer forms a base coat layer on the surface and the second paint layer forms a top coat layer having a top coat thickness on the PVD coating, wherein at least the top coat layer was produced with UV-curable paint. Proceeding from the interface of the PVD coating in a region smaller than the top coat thickness, the top coat layer has a lower degree of cross-linking induced by UV light than in the part of the top coat layer connected to said region. The invention relates in particular to a method for producing such a component.

UV irradiation apparatus with an additional monochromatic radiation source

An irradiation device including at least one radiation source, which emits both UV-radiation and W-radiation, i.e. visible light and/or IR radiation. The device includes a transport device for delivering substrates to be irradiated. At least one wavelength-selective filter reflects UV-radiation at an angle of 45&#xb0; and transmits W-radiation. Means for the absorption of IR radiation are arranged downstream of the optical filter in the propagation direction in the beam path of the W-radiation not deflected by the wavelength-selective filter. The means for the absorption of IR radiation are also designed to absorb visible light and UV rays, and the irradiation device includes movement means in order to guide the wavelength-selective filter into and out of the beam path of the radiation source.

UV irradiation device for clocked operation

A sample substrate adapted for use with fluorescence excitation light with a first wavelength. A reflector is disposed on a base. The reflector includes a reflecting multilayer interference coating with at least two layers. Not all of the layers L fulfill a quarterwave condition: dL&#xb7;nL=(2N+1)&#xb7;&#xbc; wherein dL is a physical thickness of layer L, nL is an index of refraction of layer L at the first wavelength, N is an integer equal to or greater than zero and 1 is the first wavelength. Thicknesses of the layers ensure that any fluorescent sample material disposed on top of said multilayer interference coating would be located near an antinode of a standing wave formed by the excitation light with the first wavelength incident on said substrate.

Optical substrate for enhanced detectability of fluorescence

A sample substrate adapted for use with fluorescence excitation light with a first wavelength. A reflector is disposed on a base. The reflector includes a reflecting multilayer interference coating with at least two layers. Not all of the layers L fulfill a quarterwave condition: dL&#xb7;nL=(2N+1)&#xb7;1/4 wherein dL is a physical thickness of layer L, nL is an index of refraction of layer L at the first wavelength, N is an integer equal to or greater than zero and 1 is the first wavelength. Thicknesses of the layers ensure that any fluorescent sample material disposed on top of said multilayer interference coating would be located near an antinode of a standing wave formed by the excitation light with the first wavelength incident on said substrate.

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Mels, Switzerland

Martin Kaspar