Sperry Corporation

Martin J Casey

Barry F Stein

Herman E Wetterskog

John E Sheppard

A plasma etching process and apparatus wherein a gas plasma comprising dichlorofluoro-methane (CHCl.sub.2 F) etches a film.

Plasma etching process and apparatus

An x-ray mask is made by forming a thin polyimide membrane on a silicon wafer substrate which is then back-etched to form a mask supporting ring of the substrate.

Method of making x-ray masks

A bubble memory device and method of fabrication are disclosed which establish that there is a correlation between bubble memory performance and the properties of a quartz film, which is interposed between the bubble film and metallic overlays, namely, the permalloy and/or conductor layers of the device. Specifically, it has been established that there is a correlation between improved device performance and a low p-etch rate which is a measurement that establishes certain elastic constants of the quartz (i.e., the response of the device to stress).

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Lansdale, PA, United States of America

Martin J Casey