Infineon Technologies Austria Ag

Infineon Technologies Ag

Infineon Technologies Austin Ag

Martin Henning Vielemeyer

Franz Hirler

Martin Poelzl

Oliver Blank

Walter Rieger

Li Juin Yip

Robert Paul Haase

Gerhard Nöbauer

Milko Paolucci

Andreas Peter Meiser

Ralf Siemieniec

Michael Hutzler

Martin Pölzl

Till Schloesser

Oliver Haeberlen

Gilberto Curatola

Ling Ma

Joachim Krumrey

Sylvain Leomant

Andrew Christopher Graeme Wood

Britta Wutte

Gianmauro Pozzovivo

Heimo Hofer

Ashita Mirchandani

Harsh Naik

Lutz Goergens

Minghao Jin

Johannes Schoiswohl

Jyotshna Bhandari

Markus Zundel

Hans Weber

Rolf Weis

Petteri Palm

Peter Irsigler

Gerhard Noebauer

Michael Treu

Cesar Augusto Braz

Juan Sanchez

Eslam Abdelhamid

Mahadi-Ul Hassan

Thomas Gebhard

Martin PöIzl

Sylvain Léomant

Sonja Krumrey, Legal Representative

A pre-packaged chip includes a chip having at least one electrical top contact at a top side of the chip and at least one electrical bottom contact at a bottom side, a first laminate layer on the top side, a second laminate layer on the bottom side, the first laminate layer and the second laminate layer being laminated together to sandwich the chip therebetween, a first metal layer on the first laminate layer and electrically contacted to the at least one electrical top contact via at least one top contact hole through the first laminate layer, and a second metal layer on the second laminate layer and electrically contacted to the at least one electrical bottom contact via at least one bottom contact hole through the second laminate layer. The pre-packaged chip is free from any contact hole extending from the first metal layer to the second metal layer.

Pre-packaged chip, method of manufacturing a pre-packaged chip, semiconductor package and method of manufacturing a semiconductor package

A method for manufacturing a semiconductor transistor device includes etching a vertical gate trench into a silicon region, depositing a silicon gate material on an interlayer dielectric formed in the vertical gate trench so that an upper side of the interlayer dielectric is covered, etching through the silicon gate material in the vertical gate trench to partly uncover the upper side of the interlayer dielectric and so that a silicon gate region of a gate electrode of the semiconductor transistor device remains in the vertical gate trench, and depositing a metal material into the vertical gate trench so that the partly uncovered upper side of the interlayer dielectric is covered by the metal material.

Semiconductor transistor device and method of manufacturing the same

A transistor device with a gate electrode in a vertical gate trench is described. The gate electrode includes a silicon gate region and a metal inlay region. The silicon gate region forms at least a section of a sidewall of the gate electrode. The metal inlay region extends up from a lower end of the gate electrode.

A transistor device includes, in a semiconductor body, a drift region, a body region, and a source region separated from the drift region by the body region and connected to a source node. The transistor device further includes a gate electrode dielectrically insulated from the body region by a gate dielectric, and a field electrode structure. The field electrode structure includes: a first field electrode connected to the source node and dielectrically insulated from the drift region by a first field electrode dielectric; a second field electrode dielectrically insulated from the drift region by a second field electrode dielectric; and a coupling circuit connected between the second field electrode and the source node and configured to connect the second field electrode to the source node dependent on a voltage between the source node and the second field electrode.

Transistor device

A method of manufacturing a semiconductor die includes: forming a power HEMT (high-electron-mobility transistor) in a III-nitride semiconductor substrate, the power HEMT having a gate, a source and a drain; monolithically integrating a first gate driver HEMT with the power HEMT in the III-nitride semiconductor substrate, the first gate driver HEMT having a gate, a source and a drain and logically forming part of a driver; and electrically connecting the first gate driver HEMT to the gate of the power HEMT so that the first gate driver HEMT is operable to turn the power HEMT off or on responsive to an externally-generated control signal received from the driver or other device.

Method of manufacturing a semiconductor die

A semiconductor device includes a transistor in a semiconductor body having a first main surface. The transistor includes: a source contact electrically connected to a source region; a drain contact electrically connected to a drain region; a gate electrode at the channel region, the channel region and a drift zone disposed along a first direction between the source and drain regions, the first direction being parallel to the first main surface, the channel region patterned into a ridge by adjacent gate trenches formed in the first main surface, the adjacent gate trenches spaced apart in a second direction perpendicular to the first direction, a longitudinal axis of the ridge extending in the first direction and a longitudinal axis of the gate trenches extending in the first direction; and at least one of the source and drain contacts being adjacent to a second main surface opposite the first main surface.

Semiconductor device having a channel region patterned into a ridge by adjacent gate trenches

A semiconductor device includes a transistor in a semiconductor substrate having a main surface. The transistor includes a source region, a drain region, a channel region, a drift zone, a gate electrode, and a gate dielectric adjacent to the gate electrode. The gate electrode is disposed adjacent to at least two sides of the channel region. The channel region and the drift zone are disposed along a first direction parallel to the main surface between the source region and the drain region. The gate dielectric has a thickness that varies at different positions of the gate electrode.

Semiconductor device including a transistor with a gate dielectric having a variable thickness

A semiconductor device includes first and second field electrode structures that extend from a first surface into a semiconductor portion. The first field electrode structures include a first field dielectric insulating spicular first field electrodes against the semiconductor portion. The second field electrode structures include a second field dielectric insulating spicular second field electrodes against the semiconductor portion. The second field dielectric is thicker than the first field dielectric. Openings of the first and second field electrode structures in the first surface may be non-circular symmetric, wherein the openings of the second field electrode structures are tilted with respect to the openings of the first field electrode structures. Alternatively or in addition, the openings of the second field electrode structures in the first surface may be greater than the openings of the first field electrode structures.

Semiconductor device with first and second field electrode structures

A method for manufacturing a semiconductor device includes: providing a semiconductor substrate having a first side; forming a trench in the semiconductor substrate, the trench having a bottom and a sidewall extending from the bottom to the first side of the semiconductor substrate; forming an insulation structure including at least a first insulation layer and a second insulation layer on the sidewall and the bottom of the trench; forming a lower conductive structure in the lower portion of the trench; removing the second insulation layer in an upper portion of the trench while leaving the second insulation layer at least partially in a lower portion of the trench; and forming an upper conductive structure in the upper portion of the trench.

Method for manufacturing a semiconductor device

A method of forming a semiconductor device is provided. The device includes a semiconductor substrate having a main surface and a rear surface vertically spaced apart from the main surface, a first doped region, a second doped region and a third doped region. The third doped region is interposed between the first and second doped regions beneath the main surface. Field plate trenches having field plates vertically extend from the main surface to a bottom that is arranged in the first doped region. A gate trench having a gate electrode vertically extends from the main surface to the first doped region. A compensation zone vertically extends from the bottom of the gate trench deeper into the first doped region. The compensation zone is laterally aligned with the gate trench and is adjacent to the field plates along a cross-sectional plane of the device that is parallel to the main surface.

Method of manufacturing a semiconductor device having a charge compensation region underneath a gate trench

A semiconductor die includes a semiconductor substrate having a first region and a second region isolated from the first region. A power transistor disposed in the first region of the semiconductor substrate has a gate, a source and a drain. A gate driver transistor disposed in the second region of the semiconductor substrate has a gate, a source and a drain. The gate driver transistor is electrically connected to the gate of the power transistor and operable to turn the power transistor off or on responsive to an externally-generated control signal applied to the gate of the gate driver transistor. A first contact pad is electrically connected to the source of the power transistor, and a second contact pad is electrically connected to the drain of the power transistor. A third contact pad is electrically connected to the gate of the gate driver transistor for receiving the externally-generated control signal.

Power transistor with at least partially integrated driver stage

A semiconductor device includes a semiconductor body, having a first surface, a gate electrode structure, which includes polycrystalline silicon, of an IGFET in a first trench extending from the first surface into the semiconductor body. The device also includes a semiconductor element, which is different from the gate electrode structure of the IGFET and includes polycrystalline silicon, in a second trench extending from the first surface into the semiconductor body, wherein the polycrystalline silicon of the IGFET and of the semiconductor element different therefrom ends below a top side of an insulation layer adjoining the first surface of the semiconductor body.

Semiconductor device having a polycrystalline silicon IGFET

A semiconductor device includes a semiconductor body having a front side and a back side, and a trench included in the semiconductor body. The trench extends into the semiconductor body along an extension direction that points from the front side to the back side. The trench includes an electrode structure and an insulation structure, the insulation structure insulating the electrode structure from the semiconductor body and the electrode structure being arranged for receiving an electric signal from external of the semiconductor device. The electrode structure includes a first electrode and a second electrode in contact with the first electrode, the first electrode including a first electrode material and the second electrode including a second electrode material different from the first electrode material. The first electrode extends further along the extension direction as compared to the second electrode.

Semiconductor device having a trench with different electrode materials

A method for manufacturing a semiconductor device includes: providing a semiconductor substrate having a first side; forming a trench in the semiconductor substrate, the trench having a bottom and a sidewall extending from the bottom to the first side of the semiconductor substrate; forming an insulation structure including at least a first insulation layer and a second insulation layer on the sidewall and the bottom of the trench; forming a lower conductive structure in the lower portion of the trench; removing the second insulation layer in an upper portion of the trench while leaving the second insulation layer at least partially in a lower portion of the trench; and forming an upper conductive structure in the upper portion of the trench, wherein at least one of the lower conductive structure and the upper conductive structure comprises a metal, a metal alloy, a metal silicide, or a combination thereof.

Method for manufacturing a semiconductor device and power semiconductor device

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Villach, Austria

Martin Henning Vielemeyer