Evatec Ag

Martin Bless

Hartmut Rohrmann

Claudiu Falub

Stefan Rhyner

Claudiu Valentin Falub

Valentin Falub Claudiu

In a magnetron sputtering reaction space a magnetron magnetic field is generated. A further magnetic field is generated in the reaction space whereby a resultant magnetic field has a directional component parallel to a target plane which is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space.

Methods of and apparatus for magnetron sputtering

Rf power is supplied to a vacuum processing module in that in the plasma processing module a time invariant impedance transform is performed by an impedance transform network in the plasma processing module and a time variable matching is performed by a matchbox connected to the impedance transform network. The impedance transform network includes an inductive element of a hollow conductor. A cooling medium is flown through the hollow conductor of the impedance transform network as well as through a part of the plasma processing module to be cooled and not being part of the impedance transform network at the plasma processing module.

RF power delivery to vacuum plasma processing

A vacuum adapter for feeding-through vacuum-insulated coolant lines () from the surrounding atmosphere into a vacuum processing installation has an intermediate volume () which is connected firstly to at least one insulation intermediate space () of the vacuum-insulated feed lines and secondly to a vacuum pump. The pump capacity is available at least temporarily for evacuating the insulation intermediate space around the coolant lines ().

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Malans, Switzerland

Martin Bless