Asml Netherlands B.v.

Martijn Wehrens

Vahan A Senekerimyan

Ivan Sergejevitsj Nikolaev

A method and apparatus for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A polarizing beam splitter creates two beams of orthogonal polarization from a single laser, and the beams are used to generate two laser curtains. Sensors detect flashes from droplets of target material as they pass through the curtains. One sensor may detect the position of the droplets relative to a desired trajectory to the irradiation site so that the orientation of a droplet generator may be adjusted to direct subsequent droplets to the irradiation site, as in the prior art. A second sensor may detect each droplet as it passes through a curtain to determine when a source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, so that a signal may be sent to the source laser to fire at the correct time.

System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source

A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.

System and method for controlling droplet timing in an LPP EUV light source

An apparatus and method for detecting extreme ultraviolet (EUV) radiation is disclosed. The apparatus includes a detector having a top surface, a layer of scintillation material on the top surface of the detector, a layer of spacer material on the layer of scintillation material, and a spectral purity filter layer on the layer of spacer material. The method includes directing the EUV radiation through the spectral purity filter layer and through the spacer material layer. The spacer material layer may be disposed between the spectral purity filter layer and a layer of scintillation material. The method further includes detecting scintillation radiation emitted by the scintillation material using the detector.

Lithographic apparatus and detector apparatus

A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates a laser curtain, and sensors detect the droplets as they pass through the curtain. One sensor in combination with a controller detects the position of the droplets relative to a desired trajectory to the irradiation site so that a signal can be sent to an actuator of a droplet generator to adjust orientation of the droplet generator and direct subsequent droplets to the irradiation site, as in the prior art. A second sensor, or droplet detection module, also detects each droplet as it passes through the curtain, and in combination with a controller determines when the source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.

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Waalre, Netherlands

Martijn Wehrens