Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Koninklijke Philips Electronics N.v.

Martijn Van Baren

Klaas Kooijker

Fokke Roelof Voorhorst

Jacob Brinkert

Alastair Ian Blake

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Frits Van Der Meulen

Yong Jiang

Theodorus Petrus Maria Cadee

Wilhelmus Gerardus Maria Ettes

Frank Johannes Jacobus Van Boxtel

Wilhelmus Franciscus Johannes Simons

Frederik Eduard De Jong

Laurentius Johannes Adrianus Van Bokhoven

Martinus Agnes Willem Cuijpers

Jeroen Gerard Gosen

Günes Nakiboglu

Franciscus Jozef Bosman

Gerardus Adrianus Antonius Maria Kusters

Koen Cuypers

Edwin Augustinus Matheus Van Gompel

Martin Frans Pierre Smeets

Chandra Mohan Janakiraman

Gerardus Arnoldus Hendricus Franciscus Janssen

Rob Jansen

Kok Wah Ma

Swee Loon Michael Tang

Vignesh Nathamuni Balaji

Choon Hwee Tan

Pawel Leshem

Derrick Wai Thong Loke

Mong Hua Tan

Maurice Wijckmans

Mohankumar Valiyambath Mohankumar

Mohankumar Valiyambath Krishnan

Mong H Tan

Choon H Tan

Kok W Ma

Chandra M Janakiraman

Derrick W T Loke

Swee L M Tang

Alastair I Blake

A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

Lithographic apparatus and device manufacturing method

A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

The power toothbrush includes a toothbrush body and a stem portion extending from the toothbrush body which has a workpiece with a flexible membrane at a remote end thereof, and a flexible membrane at a near end thereof as well. A movable piston is positioned in the stem portion, as well as a fluid which is in communication with the flexible membrane at the workpiece end of the toothbrush and the flexible membrane at the near end of the stem portion. The body includes a solenoid coil which, when actuated, moves the piston in opposing directions in a controlled manner within the stem, which acts on the fluid in the stem and moves the flexible membrane at the workpiece in and out at a desired frequency and amplitude.

Drive system for a toothbrush using a flexible membrane for cleaning teeth

A cleaning apparatus for cleaning a hair-cutting portion of an electric hair-cutting device includes a cleaning-liquid basin for receiving the hair-cutting portion of the electric hair-cutting device in a central area such that the hair-cutting portion is at least partially immersed in the cleaning liquid. The electric hair-cutting device is cleaned by generating a cleaning-liquid flow revolving within the basin around the central area of the basin, the hair-cutting portion being at least partially immersed in the cleaning liquid. The liquid flow effectively entrains debris away from the hair-cutting portion.

Apparatus and method for cleaning an electric hair-cutting device, and kit including such an apparatus

An ironing board for multifunctional use comprising a base (), a body () with a work surface (), which body has a first longitudinal axis (I-I) and is connected to the base. A column () extends between the body and the base, the column having a second longitudinal axis (II-II) and a tilting means. The tilting means is arranged for tilting the body about a tilting axis (T-T) extending substantially perpendicularly to both the first axis and the second axis. A system comprises such an ironing board and an iron for cooperation with the ironing board. The invention further relates to a method for refreshing an article and a method for pressing an article.

Ironing board having a tiltable body

A cleaning apparatus () for cleaning a hair-cutting portion () of an electric hair-cutting device () includes a cleaning-liquid basin () for receiving the hair-cutting portion of the electric hair-cutting device in a central area such that the hair-cutting portion is at least partially immersed in the cleaning liquid (). The electric hair-cutting device is cleaned by generating a cleaning-liquid flow revolving within the basin () around the central area of the basin, the hair-cutting portion being at least partially immersed in the cleaning liquid. The liquid flow effectively entrains debris away from the hair-cutting portion.

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Joure, Netherlands

Martijn Van Baren