Asml Netherlands B.v.

Martijn Robert Hamers

Engelbertus Antonius Fransiscus Van Der Pasch

Emiel Jozef Melanie Eussen

Renatus Gerardus Klaver

Hans Butler

Marc Wilhelmus Maria Van Der Wijst

Marinus Aart Van Den Brink

Robertus Leonardus Tousain

Robbert Edgar Van Leeuwen

Jeroen Arnoldus Leonardus Johannes Raaymakers

Peter Hoekstra

Boudewijn Theodorus Verhaar

Georgo Angelis

An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.

Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system

A lithographic apparatus includes a positioner configured to position a first part of the apparatus relative to a second part of the apparatus, the positioner including a motor having a motor position dependent motor constant defining a relation between a motor input and a motor output, and a control system to drive the motor, the control system including a set-point generator to provide a reference signal based on a desired position of the first part relative to the second part, and a controller to provide a drive signal to the motor based on the reference signal, wherein the controller includes a compensator which is configured to at least partially compensate the drive signal for the motor position dependent motor constant. The invention further relates to a positioner, a method to optimize the positioning system, and a method to derive a motor position dependent motor constant.

Positioning system, method, and lithographic apparatus

In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.

Lithographic apparatus and calibration method

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's-Hertogenbosch, Netherlands

Martijn Robert Hamers