Asml Netherlands B.v.

Martijn Houkes

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Christiaan Alexander Hoogendam

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Johannes Jacobus Matheus Baselmans

Joeri Lof

Alexander Straaijer

Klaus Simon

Antonius Theodorus Anna Maria Derksen

Bernardus Antonius Slaghekke

Gerardus Petrus Matthijs Van Nunen

Hans Butler

Evert Hendrik Jan Draaijer

Nicolaas Ten Kate

Minne Cuperus

Mark Johannes Hermanus Frencken

Antonius Henricus Arends

Gerardus Petrus Mattijs Van Nunen

Levinus Pieter Bakker

Tjarko Adriaan Rudolf Van Empel

Wilhelmus Franciscus Johannes Simons

Stoyan Nihtianov

Martinus Agnes Willem Cuijpers

Ramidin Izair Kamidi

Norbert Erwin Therenzo Jansen

Patricia Vreugdewater

Menno Fien

Petrus Wilhelmus Josephus Maria Kemper

Jeroen Johan Maarten Van De Wijdeven

Marinus Maria Johannes Van De Wal

Edwin Teunis Van Donkelaar

Marcus Joseph Elisabeth Godfried Breukers

Robertus Johannes Van Vliet

Roland Petrus Hendrikus Hanegraaf

Ramidin Izair Kamidin

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Lithographic apparatus and device manufacturing method

A positioning apparatus includes a first object and a second object; a positioning system configured to position the first and the second objects with respect to each other; and a flexible transportation line that is connected to the first and the second objects, the flexible transportation line having a stiffness that varies along the flexible transportation line such that the flexible transportation line can be represented by a dynamic transfer function, the dynamic transfer function being adapted to a closed-loop transfer function of the positioning system.

Lithographic apparatus with flexible transportation line having varying stiffness between two objects

A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the center of gravity of the object into a second control signal, representing an equivalent set of forces to be provided by the plurality of actuators. The system is further configured such that a first gain balancing matrix is used at a first frequency band and a second gain balancing matrix is used at a second frequency band.

Controller, lithographic apparatus, method of controlling the position of an object and device manufacturing method

A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

Lithographic apparatus, immersion projection apparatus and device manufacturing method

A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.

A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.

A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion fluid in a space between a downstream lens of the projection system and the substrate, and a fluid supply system position measurement system to measure a position quantity of the fluid supply system. To prevent a collision between the fluid supply system and the substrate table, a damage control system of the lithographic apparatus may include a calculator to calculate a dimensional quantity of a gap between the fluid supply system and the substrate table from the positioned quantity of the substrate table and the position quantity of the fluid supply system. The damage control system may generate a warning signal when the dimensional quantity goes beyond a predetermined safety level.

Lithographic apparatus immersion damage control

Growing community of inventors

Sittard, Netherlands

Martijn Houkes