Asml Netherlands B.v.

Martijn Houben

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Sander Catharina Reinier Derks

Johannes Henricus Wilhelmus Jacobs

Hendrikus Johannes Marinus Van Abeelen

Armand Rosa Jozef Dassen

Raymond Wilhelmus Louis Lafarre

Ruud Hendrikus Martinus Johannes Bloks

Jim Vincent Overkamp

Gerben Pieterse

Siegfried Alexander Tromp

Sjoerd Nicolaas Lambertus Donders

Rene Theodorus Petrus Compen

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Koen Steffens

Ronald Van Der Ham

Rogier Hendrikus Magdalena Cortie

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Adrianus Hendrik Koevoets

Theodorus Wilhelmus Polet

Wilhelmus Franciscus Johannes Simons

Thomas Poiesz

Ivo Adam Johannes Thomas

Han Henricus Aldegonda Lempens

Marcus Martinus Petrus Adrianus Vermeulen

Gregory Martin Mason Corcoran

Marinus Jan Remie

Justin Johannes Hermanus Gerritzen

Marco Adrianus Peter Van Den Heuvel

Pieter Lein Joseph Gunter

Menno Fien

Coen Cornelis Wilhelmus Verspaget

Van Vuong Vy

Niek Elout De Kruijf

Maarten Van Beijnum

Marcus Adrianus Van De Kerkhof

Roelof Frederik De Graaf

Nina Vladimirovna Dziomkina

Paulus Martinus Maria Liebregts

Niek Jacobus Johannes Roset

Yuri Johannes Gabriël Van De Vijver

Abraham Alexander Soethoudt

Gijs Kramer

Coen Hubertus Matheus Baltis

Oleg Voznyi

Simon Karel Ravensbergen

Remko Wakker

Nicholas Peter Waterson

Gerardus Martinus Antonius De Rooij

Vijay Kumar Badam

Johanna Antoinette Maria Sondag-Huethorst

Vincentius Fransiscus Cloosterman

Majid El Bouchaibi

Franciscus Johannes Maria Boekholt

Erik Roelof Loopstra

Joost Jeroen Ottens

Nicolaas Rudolf Kemper

Andre Bernardus Jeunink

Frits Van Der Meulen

Frank Johannes Jacobus Van Boxtel

Mircea Dusa

Youssef Karel Maria De Vos

Peter Paul Hempenius

Peter Smits

Gerardus Petrus Matthijs Van Nunen

Paul Corné Henri De Wit

Antonie Hendrik Verweij

Robertus Mathijs Gerardus Rijs

Stijn Willem Boere

Paul Van Dongen

Alwin De Kock

Antonius Arnoldus Meulendijks

Johannes Gerardus Maria Mulder

Thibault Laurent

Johannes Jacobs

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

Rogier Cortie

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

Extraction body for lithographic apparatus

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

Substrate holder, a lithographic apparatus and method of manufacturing devices

A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

System for positioning an object in lithography

A substrate table supports a substrate holder to which a substrate is clamped for exposure. The substrate table has a plurality of e-pins spaced apart from and distributed around the center of the substrate holder to receive, and lower, a substrate onto the substrate holder prior to exposure, and to raise a substrate off the substrate holder after exposure. Tip portions of the e-pins and the corresponding apertures in the substrate holder have a shape in plan including at least one re-entrant, e.g. a cross shape.

Substrate holder and support table for lithography

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's-Hertogenbosch, Netherlands

Martijn Houben