Asml Netherlands B.v.

Marteijn De Jong

Joost Jeroen Ottens

Koen Jacobus Johannes Maria Zaal

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Frits Van Der Meulen

Leon Martin Levasier

Marinus Aart Van Den Brink

Frederik Eduard De Jong

Marcel Hendrikus Maria Beems

Edwin Cornelis Kadijk

Johannes Wilhelmus De Klerk

Jan Cornelis Van Der Hoeven

Franciscus Van De Mast

Peter Franciscus Wanten

Judocus Marie Dominicus Stoeldraijer

Antonius Johannes De Kort

David Lucien Anstotz

Richard Bernardus Johannes Droste

An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.

Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method

Growing community of inventors

Wintelre, Netherlands

Marteijn De Jong