Infineon Technologies Ag

Brewer Science, Inc.

Infineon Technologies Richmond, LP

Steag Hamatech Ape Gmbh & Co. Kg

Marlene Strobl

Douglas J Guerrero

Peter Dress

Heiko Hommen

William Roberts

Jens Stäcker

Karl Schumacher

Werner Saule

Jens Uwe Bruch

Anatol Schwersenz

Andreas Nöring

Christian Bürgel

Paul Williams

Martin Tschinkl

Alice F Martin

The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly () for applying a liquid to a substrate, said assembly having a nozzle body () comprising a plurality of nozzles () that are substantially arranged in a line and a guide plate () that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles () above the lower edge are directed towards the guide plate () in such a way that a film of liquid forms on the guide plate () and flows over the lower edge ().

Nozzle assembly for applying a liquid to a substrate

The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.

Method for carrying out a double or multiple exposure

A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent. The system also includes a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product, and a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating.

Anti-reflective coating conformality control

Growing community of inventors

Dresden, Germany

Marlene Strobl