Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Asml Netherlands B.v.

Other

Markus Weiss

Wolfgang Singer

Frank Melzer

Johannes Wangler

Joachim Hainz

Wilhelm Egle

Andreas Heisler

Andreas Seifert

Vadim Yevgenyevich Banine

Martin Antoni

Axel Scholz

Johann Trenkler

Michiel David Nijkerk

Joachim Wietzorrek

Philipp Bosselmann

Stefan Dornheim

Jochen Wietzorrek

Manfred Maul

Hubert Holderer

Bernhard Gellrich

Bernhard Geuppert

Hartmut Enkisch

Bernd Kleemann

Bastiaan Matthias Mertens

Fokko Pieter Wieringa

Marco Wedowski

Erich Schubert

Gisela Sipos

Nadyeh Shariloo, Legal Representative

Heinz Mann

Johannes Hubertus Josephina Moors

Levinus Pieter Bakker

Ralph Kurt

Dirk Heinrich Ehm

Christoph Zaczek

Bastiaan Theodoor Wolschrijn

Stephan Muellender

Berndt Warm

Hubert Adriaan Van Mierlo

Karl Heinz Schuster

Marc Hubertus Lorenz Van Der Velden

Wolfgang Seitz

Ulrich Haag

Marcel Dierichs

Peter Kloesch

Tobias Hackl

Karlfried Osterried

Michael Ringel

Jurgen Faltus

Bernd Warm

Roel Moors

H A Van Mierlo

Stephan Müllender

Jürgen Faltus

To prevent reflective optical elements () for EUV lithography from becoming electrically charged as they are irradiated with EUV radiation (), an optical system for EUV lithography is proposed, having a reflective optical element (), including a substrate () with a highly reflective coating () emitting secondary electrons when irradiated with EUV radiation (), and a source () of electrically charged particles, which is arranged in such a manner that electrically charged particles are applied to the reflective optical element (), wherein the source () for the charge carrier compensation is exclusively a flood gun applying electrons to the reflective optical element ().

Optical system for EUV lithography with a charged-particle source

The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

EUV illumination system with a system for measuring fluctuations of the light source

A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.

Device for damping vibrations in projection exposure apparatuses for semiconductor lithography

An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

A faceted mirror apparatus includes a support plate having a plurality of stepped reception bores into which are fitted the base portions of respective ones of a plurality of mirror facets having mirrored surfaces. An outer surface of each of the facets bears on an inner wall to provide a stable alignment of the optical axes of the mirrored surfaces such that the apparatus generates a beam of rays from impinging rays.

Faceted mirror apparatus

The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.

Lithographic apparatus, system and device manufacturing method

There is provided an illumination system that includes (a) a light source that emits light having a wavelength &#x2266;193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Illumination system for a wavelength of &#x2266; 193 nm, with sensors for determining an illumination

There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end.

Collector configured of mirror shells

There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.

Optical system having an optical element that can be brought into at least two positions

A facet mirror () is provided with a number of mirror facets (), in which the mirror facets () respectively have a spherical or conical facet body () with a reflecting surface (). The side of the facet body () averted from the reflecting surface () is mounted in a bearing device ().

Facet mirror having a number of mirror facets

There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength &#x2266;193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Collector with fastening devices for fastening mirror shells

An illumination system, particularly for wavelengths &#x2266;100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.

Illumination system with a grating element

In a method for the production of a facetted mirrorhaving a plurality of mirror facetsand', which have mirror surfacesand are fitted into reception bores&#x2032; of a support platethe mirror facets&#x2032; are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet&#x2032; fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet&#x2032; in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Method for the production of a facetted mirror

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Aalen, Germany

Markus Weiss