Asml Netherlands B.v.

Markus Rolf Werner Matthes

Franciscus Johannes Joseph Janssen

Marinus Aart Van Den Brink

Edwin Cornelis Kadijk

Marcel Johannus Elisabeth Hubertus Muitjens

Nicolas Alban Lallemant

Hubert Matthieu Richard Steijns

Johannes Paul Marie De La Rosette

André Gillis Van De Velde

Jan Liefooghe

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

Lithographic apparatus

Growing community of inventors

Cologne, Germany

Markus Rolf Werner Matthes