Carl Zeiss Smt Gmbh

Markus Holz

Jan Horn

Hubert Holderer

Ulrich Mueller

Ulrich Bihr

Matthias Manger

Daniel Runde

Juergen Baier

Joachim Welker

Fabian Haacker

Joerg Specht

Joerg Lichtenthaeler

André Orthen

Markus Hauf

Udo Dinger

Johannes Eisenmenger

Willi Anderl

Stefan Krone

Benedikt Knauf

Yanko Sarov

Benjamin Sigel

Stefan Seitz

Christian Körner

Klaus Syrowatka

Mark Christof Wengler

Manuel Stompe

Norman Kretzschmar

A method for generating a mathematical model (MM) for positioning individual mirrors (') of a facet mirror () in an optical system (), e.g. in a lithography apparatus (A,B). The method includes: a) providing (S) target positions (SP) of the individual mirrors (′) with an adjustment unit (), b) capturing (S) actual measurement positions (MI) of the individual mirrors (′) with a measuring device (), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S) a mathematical model (MM) for positioning the individual mirrors (′) based on the captured actual measurement positions (MI) and the target positions (SP). In step c), a difference (EA) is formed (S) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S) based on the difference (EA) formed.

Method for generating a mathematical model for positioning individual mirrors of a facet mirror in an optical system

A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.

Facet mirror for an illumination optical unit of a projection exposure apparatus

The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.

Method for producing an illumination system for an EUV projection exposure system, and illumination system

An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices.

Apparatus and method for operating an apparatus

A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.

Control device

The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.

Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system

A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.

Lithography apparatus and method for operating a lithography apparatus

A mirror device includes at least one electrically conductive shielding element, which forms a mechanism for producing an electric field in a region adjacent to at least one side surface and/or a rear side of a mirror body.

Mirror device

An external facility is used to control positioning of multiple displaceable mirror elements of a multi-mirror arrangement. The external facility is to a multi-mirror arrangement via a data channel having a bandwidth of at least 1 kHz per controlled degree of freedom of displacement.

Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement

An apparatus for establishing a tilt angle of at least one mirror of a lithography installation is disclosed. The apparatus includes a pattern generating device () for generating a pattern. The apparatus also includes an image acquisition device for acquiring the generated pattern which was reflected by the mirror. The apparatus further includes a comparator device for providing a comparison result in a manner dependent on a comparison of the acquired pattern with a reference pattern. In addition, the apparatus includes an evaluation device for establishing the tilt angle in a manner dependent on the comparison result. The image acquisition device and the comparator device are provided in the same integrated circuit.

Device for determining a tilt angle of at least one mirror of a lithography system, and method

An optical component includes at least one micro-opto-electro-mechanical system (MOEMS) with a front side and a rear side. The optical component also includes at least one printed circuit board arranged on the rear side of the at least one MOEMS. The at least one printed circuit board has lateral contacts. The at least one printed circuit board may be equipped with electronic parts and cooling elements. The at least one MOEMS projects laterally beyond the at least one printed circuit board.

Growing community of inventors

Aalen, Germany

Markus Holz