Carl Zeiss Smt Gmbh

Asml Netherlands B.v.

Mattson Thermal Products Gmbh

Carl-zeiss-smt Ag

Mattson Technology, Inc

Steag Rtp Systems Gmbh

Steag Ast

Other

Steag Ast Elektronik Gmbh

Markus Hauf

Stefan Hembacher

Timo Laufer

Holger Walter

Jochen Weber

Norman Baer

Toralf Gruner

Ulrich Loering

Guido Limbach

Franz-Josef Stickel

Oliver Natt

Ulrich Schoenhoff

Arif Kazi

Payam Tayebati

Gero Wittich

Yim-Bun-Patrick Kwan

Jan Van Schoot

Peter Kuerz

Sascha Bleidistel

Joachim Hartjes

Ole Fluegge

Udo Dinger

Martin Endres

Heinrich Walk

Bastiaan Stephanus Hendricus Jansen

Alexander Vogler

Michael Thier

Alexander Sauerhoefer

Christoph Striebel

Lars Wischmeier

Fabian Haacker

Gerhard Focht

Martin Latzel

Hubert Holderer

Boris Bittner

Stig Bieling

Eric Eva

Olaf Conradi

Wolfgang Hummel

Johannes Eisenmenger

Thorsten Rassel

Severin Waldis

Baerbel Schwaer

Thomas Knarr

Yanko Sarov

Christoph Merkl

Werner Blersch

Ulrich Schönhoff

Horst Balthasar

Uwe M&uuml;ller

Erik Roelof Loopstra

Markus Deguenther

Damian Fiolka

Michael Totzeck

Ulrich Wegmann

Bernhard Geuppert

Aksel Goehnermeier

Jan Horn

Markus Schwab

Edwin Johan Buis

Rolf Bremensdorfer

Martin Schriever

Ulrich Mueller

Alexander Wolf

Dirk Hellweg

Berndt Warm

Yao Zhi Hu

Wilfried Lerch

Ralf Stuetzle

Markus Holz

Erich Merz

Jens Ossmann

Norbert Kerwien

Marius Ravensbergen

Wilfried Noell

Ralf Scharnweber

Sing-Pin Tay

Tilmann Heil

Stephan Kellner

Florian Bart

Ralf Ameling

Juergen Huber

Marc Kirch

Henner Baitinger

Marco Jassmann

Gerhard Beurer

Gerald Rothenhoefer

Caglar Ataman

Igor Gurevich

Yves Petremend

Lothar Kulzer

Christian Steigerwald

Kai-Uwe Berroth

Cornelia Buehler

Uwe Ruby

Silke Paul

Jochen Urban

Roland Mader

Eylem Bektas

Mark Christof Wengler

A method and an apparatus for determining the heating state of an optical element in a microlithographic optical system involves at least one contactless sensor which is based on the reception of electromagnetic radiation from the optical element. The radiation range captured by the sensor is varied for the purposes of ascertaining a temperature distribution in the optical element.

Method and device for determining the heating state of an optical element in an optical system for microlithography

The disclosure provides a method for determining at least one property of an EUV source in a projection exposure apparatus for semiconductor lithography, wherein the property is determined on the basis of the electromagnetic radiation emanating from the EUV source, and wherein a thermal load for a component of the projection exposure apparatus is determined and the property is deduced on the basis of the thermal load determined.

Method for determining properties of an EUV source

A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. All actuator electrodes are arranged in a single plane. The actuator electrodes form a direct drive for pivoting the mirror element.

Device for swiveling a mirror element with two degrees of swiveling freedom

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

A sensor device for capturing the displacement position of an optical component includes a plurality of stator electrodes and a mechanism or restricting the electric field that is relevant to the measurement of the displacement position to the region of the stator electrodes.

Sensor device

The disclosure relates to a device for transmitting electrical signals between a first interface element, arranged at a first structure of a lithography system, and a second interface element, arranged at a second structure of the lithography system. An electrical conductor connects the first interface element and the second interface element. The device has a hollow body which surrounds at least sections of the electrical conductor and which is designed to electromagnetically shield the electrical conductor. A gap is provided in the hollow body or between the hollow body and one of the structures and allows a relative movement of the first structure and the second structure to mechanically decouple the first structure from the second structure.

Device for transmitting electrical signals, and lithography apparatus

A method for illuminating an object field of a projection exposure apparatus includes providing a subset of first facets to be positioned in park positions, which are each spaced apart from an associated target position, but at most by a maximum distance.

Method for illuminating an object field of a projection exposure system

The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.

Arrangement for actuating at least one optical element in an optical system

The invention relates to a projection exposure apparatus for semiconductor lithography, comprising an illumination system for illuminating a mask arranged on a movable mask stage, and comprising a projection lens for imaging the mask onto a semiconductor substrate, wherein at least one means is present for at least partly decoupling at least parts of the illumination system and/or of the projection lens from the influence of pressure fluctuations in the medium surrounding the projection lens or the illuminated system, the pressure fluctuations being attributed to movements of the mask stage during the operation of the apparatus.

Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations

The disclosure relates to arrangements for manipulating the position of an element. An arrangement according has at least one actuator for each degree of freedom of the positional manipulation for exerting adjustable forces on the element, at least one position sensor for each degree of freedom of the positional manipulation for generating in each case a sensor signal that is characteristic of the position of the element, and at least one position controller, which in a position control circuit controls a force exerted on the element by the at least one actuator for the positioning of the element in dependence on the at least one sensor signal. At least one actuator and at least one position sensor are mounted on a common module frame.

Arrangement for manipulating the position of an element

A mirror device includes at least one electrically conductive shielding element, which forms a mechanism for producing an electric field in a region adjacent to at least one side surface and/or a rear side of a mirror body.

Mirror device

A lithography device includes an eddy-current brake for damping the movement of a structural element of the lithography device. The eddy-current brake includes a plurality of magnets disposed in an arc-shaped arrangement, and a plurality of electrically conductive sheets arranged respectively between adjacent ones of the magnets. A relative movement between the magnets and the electrically conductive sheets in a direction to be damped inducing eddy currents in the electrically conductive sheets.

Lithography device with eddy-current brake

A mirror array includes a multiplicity of displaceable individual mirrors which are subdivided into at least two groups. The individual mirrors of the first group are displaceable in a very precise manner, and the individual mirrors of the second group are displaceable in a very quick manner.

Mirror array

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Ulm, Germany

Markus Hauf