Infineon Technologies Ag

Intel Mobile Communications Gmbh

Intel Deutschland Gmbh

Markus Brunnbauer

Thorsten Meyer

Jens G Pohl

Edward Fuergut

Recai Sezi

Stephan Bradl

Harry Hedler

Gottfried Beer

Irmgard Escher-Poeppel

Klaus Pressel

Ralf Plieninger

Joachim Mahler

Hans-Joachim Barth

Gunther Mackh

Daniel Porwol

Rainer Steiner

Michael Bauer

Andreas Wolter

Manfred Mengel

Franco Mariani

Werner Kroeninger

Markus Fink

Hans-Gerd Jetten

Korbinian Kaspar

Frank Zudock

Bernhard Drummer

Ralf Otremba

Josef Hoeglauer

Helmut Strack

Bernd Waidhas

Xaver Schloegel

Christian Geissler

Sven Albers

Thomas Wagner

Heinrich Koerner

Adolf Koller

Werner Robl

Peter Strobel

Christian Stuempfl

Ulrich Wachter

Ottmar Geitner

Snezana Jenei

Grit Sommer

Jan Proschwitz

Jochen Mueller

Josef Schwaiger

Christof Matthias Schilz

Marcus Kastner

David O'Sullivan

Ludwig Schneider

Jesus Mennen Belonio

Stephan Brandl

Jenei Snezana

According to various embodiments, a method for processing a carrier may include: forming an arrangement of defects in the carrier, wherein a surface region of the carrier is disposed over the arrangement of defects at a first surface of the carrier, wherein the arrangement of defects is configured to generate a crack structure extending from the arrangement of defects into the surface region; partially removing the carrier to remove the arrangement of defects; and separating the surface region of the carrier into a plurality of surface region portions along the crack structure.

Carrier arrangement and method for processing a carrier by generating a crack structure

Separation grooves are etched from a main surface into a semiconductor substrate. The separation grooves separate chip regions in horizontal directions parallel to the main surface. At least some of the separation grooves are spaced from a lateral outer surface of the semiconductor substrate by at most a first distance. An indentation is formed along a lateral surface. The indentation extends from the main surface into the semiconductor substrate. A minimum horizontal indentation width of the indentation is equal to or greater than the first distance. A with respect to the main surface vertical extension of the indentation is equal to or greater than a vertical extension of the separation grooves.

Method of separating semiconductor dies from a semiconductor substrate, semiconductor substrate assembly and semiconductor die assembly

A method of dicing a wafer may include forming a plurality of active regions in a wafer, each active region including at least one electronic component, the active regions extending from a first surface of the wafer into the wafer by a height and being separated by separation regions, forming at least one trench in the wafer by plasma etching in at least one separation region from the first surface of the wafer. The at least one trench is extending into the wafer farther than the plurality of active regions. The method may further include processing a remaining portion of the wafer in the separation region to separate the wafer into individual chips.

Method of dicing a wafer and semiconductor chip

A workpiece has at least two semiconductor chips, each semiconductor chip having a first main surface, which is at least partially exposed, and a second main surface. The workpiece also comprises an electrically conducting layer, arranged on the at least two semiconductor chips, the electrically conducting layer being arranged at least on regions of the second main surface, and a molding compound, arranged on the electrically conducting layer.

Workpiece with semiconductor chips, semiconductor device and method for producing a workpiece with semiconductor chips

A method of dicing a wafer may include forming a plurality of active regions in a wafer, each active region including at least one electronic component, the active regions extending from a first surface of the wafer into the wafer by a height and being separated by separation regions, the separation regions being free from metal, forming at least one trench in the wafer by plasma etching in at least one separation region from the first surface of the wafer. The at least one trench is extending into the wafer farther than the plurality of active regions. The method may further include processing a remaining portion of the wafer in the separation region to separate the wafer into individual chips.

A panel with a reconfigured wafer including semiconductor chips arranged in rows and columns on semiconductor device positions includes: at least one semiconductor chip having a front, a rear and edge sides provided per semiconductor device position. The reconfigured wafer includes: a front side that forms a coplanar area with the front sides of the at least one semiconductor chip and a plastic housing composition embedding the edge sides and the rear side of the at least one semiconductor chip. The reconfigured wafer includes, on a rear side of the wafer, structures configured to stabilize the panel. The structures are composed of the plastic housing composition and are formed as thickenings of the reconfigured wafer.

Article and panel comprising semiconductor chips, casting mold and methods of producing the same

A semiconductor device is disclosed. One embodiment includes a semiconductor substrate and at least two insulating elements located above the semiconductor substrate or above a mold compound embedding the semiconductor substrate. The at least two insulating elements have a first face facing the semiconductor substrate or the mold compound and a second face facing away from the semiconductor substrate or the mold compound. A conductive element for each of the at least two insulating elements extends from the first face of the insulating element to the second face of the insulating element.

Semiconductor device

A description is given of a device comprising a first semiconductor chip, a molding compound layer embedding the first semiconductor chip, a first electrically conductive layer applied to the molding compound layer, a through hole arranged in the molding compound layer, and a solder material filling the through hole.

Stackable semiconductor package with encapsulant and electrically conductive feed-through

A semiconductor device is described having at least one semiconductor chip, the chip having an active area on a top side thereof, the active area formed at least in part of low-k material, said low-k material defining a low-k subarea of said active area; an embedding material, in which said at least one semiconductor chip is embedded, at least part of the embedding material forming a coplanar area with said active area; at least one contact area within the low-k subarea; a redistribution layer on the coplanar area, the redistribution layer connected to said contact areas; at least one first-level interconnect, located outside said low-k subarea, the first-level interconnect electrically connected to at least one of said contact areas via the redistribution layer.

Semiconductor device with chip having low-k-layers

A component and a method for producing a component are disclosed. The component comprises an integrated circuit, a housing body, a wiring device overlapping the integrated circuit and the housing body, and one or more external contact devices in communication with the wiring device.

Component and method for producing a component

A system on chip comprising a RF shield is disclosed. In one embodiment, the system on chip includes a RF component disposed on a chip, first redistribution lines disposed above the system on chip, the first redistribution lines coupled to I/O connection nodes. The system on chip further includes second redistribution lines disposed above the RF component, the second redistribution lines coupled to ground potential nodes. The second redistribution lines include a first set of parallel metal lines coupled together by a second set of parallel metal lines.

On-Chip RF shields with front side redistribution lines

A method for fabricating a device, a semiconductor chip package, and a semiconductor chip assembly is disclosed. One embodiment includes applying at least one semiconductor chip on a first form element. At least one element is applied on a second form element. A material is applied on the at least one semiconductor chip and on the at least one element.

Semiconductor chip package, semiconductor chip assembly, and method for fabricating a device

Growing community of inventors

Lappersdorf, Germany

Markus Brunnbauer