Carl Zeiss Smt Gmbh

Markus Bauer

Willi Anderl

Holger Muenz

Ulrich Weber

Christof Baur

Ulrich Bingel

Jeffrey Erxmeyer

Michel Le Maire

Johannes Kraus

Kinga Kornilov

Michael Schall

Ingrid Schuster

Holger Kierey

Joachim Welte

Arno Schmittner

Petra Spies

Bernhard Weigl

Daniel Rhinow

Ottmar Hoinkis

Rainer Fettig

Marion Batz

Ann-Kathrin Wandner

Marcus Schmelzeisen

Andreas Kolloch

David Lämmle

Katharina Gries

Sebastian Vollmar

The present invention relates to a method for examining a beam of charged particles, including the following steps: producing persistent interactions of the beam with a sample at a plurality of positions of the sample relative to the beam and deriving at least one property of the beam by analyzing the spatial distribution of the persistent interactions at the plurality of positions.

Method and apparatus for examining a beam of charged particles

The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.

Method and apparatus for examining a measuring tip of a scanning probe microscope

The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.

Method for producing a reflective optical element, reflective optical element, and use of a reflective optical element

The present application relates to a method and an apparatus for determining a wavefront of a massive particle beam, including the steps of: (a) recording two or more images of a reference structure using the massive particle beam under different recording conditions; (b) generating point spread functions for the two or more recorded images with a modified reference image of the reference structure; and (c) performing a phase reconstruction of the massive particle beam on the basis of the generated point spread functions and the different recording conditions, for the purposes of determining the wavefront.

Method and apparatus for determining a wavefront of a massive particle beam

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror.

Beam reverser module and optical power amplifier having such a beam reverser module

The disclosure provides to a birefringent polarizer assembly for spatially separating polarization states of a light beam, in particular in the spectral range below 300 nm. The assembly includes a first prism on the light input side and a further prism on the light output side, which are arranged along a principal light incidence direction. The first prism has a first light entrance surface and a first light exit surface. The further prism has a further light entrance surface, facing the first light exit surface, and a further light exit surface. The prisms in each case have an optical principal crystal axis oriented substantially perpendicularly to the principal light incidence direction. The crystal axes of two adjacent prisms are oriented perpendicularly to one another. A normal to the further light exit surface forms an angle not equal to 0&#xb0; with the principal light incidence direction.

Polarizer assembly for spatially separation polarization states of a light beam

The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.

Cooler for use in a device in a vacuum

A collector mirror for an EUV microlithography system. The collector mirror includes an optical grating having an optically effective mirror surface, which reflects electromagnetic used rays in an EUV spectral range emanating from a first focal point and focuses them onto a second focal point. The first and second focal points lie on a side of the optical grating facing the mirror surface and define an optical axis. The optical grating is configured, in interaction with a stop arranged at the second focal point, to allow the used rays to pass through the stop and to block electromagnetic remaining rays in a remaining spectral range different than the EUV spectral range. The optical grating includes a blazed grating composed of a plurality of mirror facets, each having a facet surface. The facet surfaces form the mirror surface of the blazed grating.

Mirror, in particular collector mirror for microlithography

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Oberkochen, Germany

Markus Bauer