Jenoptik Optical Systems Gmbh

Markus Augustin

Jan Werschnik

Torsten Erbe

Lutz Reichmann

Stephan Fahr

The invention relates to a device comprising a beam splitter and a method of using the device. The device comprises a beam emitting unit and a downstream beam splitter, which is formed by two adjacent planar plates of different materials. For a specified wavelength range of an optical beam from which a partial beam is to be coupled out by reflection, the material of the first planar plate has a minimum refractive index which is greater by a refractive index interval than the maximum ref ractive index of the material of the second planar plate. From the optical beam, which, collimated and linearly polarized parallel to a plane of incidence, impinges on the beam splitter at a certain angle of incidence, the partial beam having only a small summary percentage of the optical beam and a small spectral fluctuation range is coupled out.

Method and device for coupling out a partial beam having a very small beam percentage from an optical beam

The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.

Method for producing a wavefront-corrected optical arrangement comprising at least two optical elements

The invention relates to an exposure device () for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.

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Jena, Germany

Markus Augustin