Veeco Instruments Inc.

Veeco Precision Surface Processing LLC

Mark Yannuzzi

John Taddei

Paul Vit

Laura Mauer

William Gilbert Breingan

John Clark

Kenji Michael Nulman

James Swallow

Christopher Orlando

Phillip Tyler

Jonathan Fijal

Christopher Hofmeister

Tremayne Diggs

Nicholas Baverov

An apparatus for supporting and maneuvering a wafer comprises a handle having a gas inlet adapted to couple to a gas supply, a supporting surface coupled to the handle section including a frame structure having edge segments connecting at vertices and spoke elements extending from a center of the frame structure to the vertices, a gas supply channel coupled to the gas inlet that extends from the handle and branches into channels that run through the spoke elements, and a plurality of nozzles positioned at the vertices on the supporting surface and coupled to the channels in the spoke elements. Gas provided to the plurality of nozzles exits the nozzles in a stream directed parallel to the supporting surface and the stream of gas generates forces that enable wafers to be securely supported in a floating manner over the supporting surface without coming into direct contact with the supporting surface.

System and method for self-cleaning wet treatment process

An apparatus and method for mixing fluids with degradational properties are disclosed herein. The present system has been devised to safely and accurately dilute, heat and deliver a degradable fluid while simultaneously removing extraneous vapor, adding capability to monitor the temperature and capability to monitor the concentration of the diluted fluid.

Apparatus and method for mixing fluids with degradational properties

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Plainview, NY, United States of America

Mark Yannuzzi