Lsi Logic Corporation

Mark Simmons

Robert Muller

John V Jensen

Duane B Barber

An embodiment of the present invention provides a novel method which makes LVR to HVR registration possible by wrapping the X and Y scribes around each instance of each layer on both the LVR and HVR reticles; standard HVR reticles and LVR reticles will not align to one another due to registration and electrical test structures in the scribe being in different locations. Another embodiment of the present invention addresses the loss of die per wafer due to increased scribe area when using LVR and HVR reticles in the same set.

Mixed LVR and HVR reticle set design for the processing of gate arrays, embedded arrays and rapid chip products

The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.

Lithography line width monitor reflecting chip-wide average feature size

An embodiment of the present invention provides a novel method which makes LVR to HVR registration possible by wrapping the X and Y scribes around each instance of each layer on both the LVR and HVR reticles; standard HVR reticles and LVR reticles will not align to one another due to registration and electrical test structures in the scribe being in different locations. Another embodiment of the present invention addresses the loss of die per wafer due to increased sribe area when using LVR and HVR reticles in the same set.

Growing community of inventors

Vancouver, WA, United States of America

Mark Simmons