Sigma-aldrich Co. LLC

Novellus Systems Incorporated

Mark Saly

Rajesh Odedra

Ravi Kanjolia

Adrien LaVoie

Daniel Moser

Neil Boag

Shaun Garratt

Jeff Anthis

Ravi Konjolia

Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R, R, R, R, Rand Rare independently and at each occurrence alkyl; R, Rand Rare independently alkyl; Rand Rare independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5. 

Molybdenum allyl complexes and use thereof in thin film deposition

Organometallic complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The organometallic complexes are (alkyl-substituted &#x3b7;-allyl)(carbonyl)metal complexes.

Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films

A method of depositing a film on a substrate surface includes providing a substrate in a reaction chamber; selecting a silicon-containing reactant from a precursor group consisting of di-tert-butyl diazidosilane, bis(ethylmethylamido)silane, bis(diisopropylamino)silane, bis(tert-butylhydrazido)diethylsilane, tris(dimethylamido)silylazide, tris(dimethylamido)silylamide, ethylsilicon triazide, diisopropylaminosilane, and hexakis(dimethylamido)disilazane; introducing the silicon-containing reactant in vapor phase into the reaction chamber under conditions allowing the silicon-containing reactant to adsorb onto the substrate surface; introducing a second reactant in vapor phase into the reaction chamber while the silicon-containing reactant is adsorbed on the substrate surface, and wherein the second reactant is introduced without first sweeping the silicon-containing reactant out of the reaction chamber; and exposing the substrate surface to plasma to drive a reaction between the silicon-containing reactant and the second reactant on the substrate surface to form the film.

Method of plasma activated deposition of a conformal film on a substrate surface

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North Andover, MA, United States of America

Mark Saly