Matheson Tri-gas, Inc.

Mark Raynor

Daniel Tempel

Larry Wagg

Junpin Yao

Robert Torres, Jr

Tadaharu Watanabe

Adam Seymour

Ade Lau

Hirotaka Mangyo

Hideharu Shimizu

Daniel Alvarez, Jr

Joseph V Vininski

Carrie L Wyse

Andrew Millward

Praveen Jha

Rikard Wind

Robin Gardiner

Tadaharu Wantanbe

Dan Davia

The present invention relates to cylinder packages utilized in the delivery of highly toxic and/or flammable compounds to semiconductor manufacturers. More specifically, the present invention provides a cartridge adapted to removably attach to the gas outlet of a gas discharge passageway in a cylinder valve provided on a toxic gas containing cylinder package, the cartridge comprising a cylindrically shaped housing having at least one end fitted with a barrier member permeable to the toxic gas contained within the cylinder package and the housing containing a toxic-gas getter material.

Getter cartridge for toxic gases inside valves

The present invention generally relates to methods and apparatuses adapted to perform additive manufacturing (AM) processes and the resulting products made therefrom, and specifically, to AM processes that employ an energy beam to selectively fuse a base material to produce an object. More particularly, the invention relates to methods and systems that use reactive fluids to actively manipulate the surface chemistry of the base material prior to, during and/or after the AM process.

Use of reactive fluids in additive manufacturing and the products made therefrom

The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).

Removal of moisture from hydrazine

The present invention relates, in general, to the purification of boron trichloride (BCl). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl) formation in BClproduction and/or the removal of SiClin BClproduct stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiClpresent to SiHwhich is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiClfrom BClthat has been partially purified to remove light boilers.

Reduction of SiCl4 in the presence of BCl3

Methods of purifying hydrogen-containing materials are described. The methods may include the steps of providing a purifier material comprising silica. The silica may be heated at temperature of about 100&#xb0; C. or more in a dry atmosphere to form activated silica. The activated silica may be contacted with a starting hydrogen-containing material, where the activated silica reduces a concentration of one or more impurity from the starting hydrogen-containing material to form the purified hydrogen-containing material, and where the activated silica does not decompose the purified hydrogen-containing material.

Removal of impurities from hydrogen-containing materials

A method of reducing moisture in a fluorine-containing gas is described. The method may include the steps of providing a purifier material that includes elemental carbon, and flowing the unpurified fluorine-containing gas having an unpurified moisture concentration over or through the carbon-based purifier material. At least a portion of the moisture is captured in the purifier material so that a purified fluorine-containing gas that emerges downstream of the purifier material has a reduced moisture concentration that is about 50% or less of the unpurified moisture concentration.

Purification of fluorine containing gases and systems and materials thereof

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Longmont, CO, United States of America

Mark Raynor