United Technologies Corporation

Mark R Jaworski

Louis L Packer

Robert W Dean

Susan Brewe

John P Zavodjancik

Timothy J Lorette

The method involves removing wax from a substrate using a non-chlorinated solvent process. The substrate is dipped in a hot wax bath or heated in an oven to remove substantially all of the wax. The substrate is then submerged in either a single or a series of hot mineral oil baths to remove any remaining wax. The oil is then removed by a semi-aqueous or light organic cleaner. The semi-aqueous cleaner is subsequently removed in an alkaline-base cleaner bath. Following the alkaline-base cleaner is a cleansing with a rinsing solution preferably a countercurrent series of rinses. Finally, the substrate is dried.

Growing community of inventors

Manchester, CT, United States of America

Mark R Jaworski