Dyson Technology Limited

The Boc Group, Inc.

Trikon Equipments Limited

Mark Philip Taylor

Peter L Timms

Adrian Kiermasz

Nolan Thomas Mccann

Knut Beekman

Angel Isidoro Nieto

Thomas James Richards

Andrew David Chadwick

Simon McClatchie

Mehdi Salehifar

A vacuum cleaner including a cleaner head defining a suction chamber and having an agitator arranged to be rotated by an agitator motor, a dirt separator, a vacuum motor arranged to draw air into the suction chamber and then into the dirt separator, and a controller. The controller is configured to monitor the electrical load of the agitator motor, compare the magnitude of the electrical load to a threshold, and selectively adjust the electrical power delivered to the vacuum motor. The controller is configured either to increase the electrical power delivered to the vacuum motor to a predetermined upper power level if the electrical load is greater than the threshold, or to decrease the electrical power delivered to the vacuum motor to a predetermined lower power level if the electrical load is smaller than the threshold.

Vacuum cleaner

A liquid short-chain polymer of the general formula R,Si(OH),or (R),SiH,(OH),is deposited on a substrate, where a&plus;b&equals;4 or a&plus;b&plus;c&equals;4, respectively, a, b and c are integers, R is a carbon-containing group and a silicon to carbon bond is indicated by Fourier Transfer Infrared analysis. The short-chain polymer is then subjected to further polymerization to form an amorphous structure of the general formula (R,SiO,),, where x and y are integers, x&plus;y&equals;4, x&ne;0, n equals 1 to &infin;, R is a carbon-containing group and a silicon to carbon bond is indicated by Fourier Transfer Infrared analysis.

Methods and apparatus for treating a semiconductor substrate

A process for the scrubbing of species of an element of Group 3, 4 and 5(b) of the Periodic Table from a gas stream. The process comprises contacting the gas stream with an aqueous solution of hydrofluoric acid (HF) or a solution containing the hydrogen fluoride ion HF.sub.2.sup.- and an oxidizing agent.

Processes for the scrubbing of noxious substances

Growing community of inventors

Bristol, United Kingdom

Mark Philip Taylor