Asml Netherlands B.v.

Mark Petrus Ubbink

Mark Scholten

Jacob Kleijn

Stephan Christiaan Quintus Libourel

A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus may be provided with a composite material wherein a layer of carbon fiber and a layer of titanium is provided within the composite.

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Apeldoorn, Netherlands

Mark Petrus Ubbink