Az Electronic Materials USA Corp.

Az Electronic Materials (luxembourg) S.a.r.l.

Clariant Finance (bvi) Limited

Braggone Oy

Merck Patent Gmbh

Mark O Neisser

Hengpeng Wu

Guanyang Lin

David J Abdallah

Jian Yin

Joseph E Oberlander

Shuji Sue Ding-Lee

Ralph R Dammel

Huirong Yao

Yi Cao

SungEun Hong

Francis Michael Houlihan

PingHung Lu

Hong Zhuang

Ping-Hung Lu

Ruzhi Zhang

Margareta Paunescu

WooKyu Kim

Medhat A Toukhy

Chunwei Chen

Zhong Xiang

Aritaka Hishida

Muthiah Thiyagarajan

Eleazar B Gonzalez

Shinji Miyazaki

Zachary Bogusz

Medhat E Toukhy

M Dalil Rahman

Munirathna Padmanaban

Raj Sakamuri

Jianhui Shan

Srinivasan Chakrapani

Alberto D Dioses

David John Abdallah

Tomohide Katayama

Orest Polishchuk

Andrew R Romano

Woo-Kyu Kim

Edward W Ng

Wenbing Kang

Georg Pawlowski

Zhong Xhiang

John Biafore

Wen-Bing Kang

Eleazor B Gonzalez

Jainhui Shan

Jain Yin

Yu Sui

Pinghung Lu

The present invention relates to novel processes for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The processes are useful for fabrication of electronic devices. The novel processes comprise a step of forming a coating of the neutral layer from the neutral layer composition, wherein the neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.

Compositions of neutral layer for directed self assembly block copolymers and processes thereof

The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

Methods and materials for removing metals in block copolymers

The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein Rrepresents a C-Csubstituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Ris a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.

Neutral layer polymer composition for directed self assembly and processes thereof

The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.

The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

Positive-working photoimageable bottom antireflective coating

The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.

Underlayer composition and process thereof

The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1,  

Antireflective composition for photoresists

A polymer comprising a siloxane polymer having at least one Si&#x2014;OH group and at least one Si&#x2014;OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40&#xb0; C. as measured by GPC is provided.

Silicon-based antireflective coating compositions

The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.

Underlayer coating composition and processes thereof

The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.

Antireflective coating composition and process thereof

The present invention relates to an antireflective coating composition comprising a novel polymer without an aromatic chromophore, where the polymer comprises a structural unit derived from an aminoplast and a structural unit derived from a diol, triol, dithiol, trithiol, other polyols, diacid, triacid, other polyacids, diimide or mixture thereof, where the diol, dithiol, triol, trithiol, diacid, triacid, diimide, diamide or imide-amide optionally contain one or more nitrogen and/or sulfur atoms or contain one or more alkene groups. The invention also relates to the novel polymer and a process for using the novel antireflective coating composition in a lithographic process.

Antireflective coating compositions

The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.

Developable bottom antireflective coating compositions are provided.

Bottom antireflective coating compositions

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Growing community of inventors

Whitehouse Station, NJ, United States of America

Mark O Neisser