US Government As Represented by the Secretary of the Army

Guild Associates, Inc.

Mark Noltimier

Joseph Anthony Rossin

Michael J Knapke

Gregory William Peterson

Michael A Pompeii

William B Feaver

Ryan Ballantyne

Rachel L Rossin

William K Clark

Chris Ritchey

Bruce Corso

Richard Warder, Jr

Nicole Puckace

Jeffery Stephen Hoene

Michael Boruch

Joseph Hunt

Neil Kennihan

Craig LaMoy

Robert Kinter

A filter is provided for removing contaminants from a gas flow (e.g., an air flow). Multiple panel filters are arranged in a filter housing. The panel filters are arranged parallel or near-parallel to a main gas flow direction and spaced apart to define elongated gas flow channels between adjacent panel filters, each elongated gas flow channel extending generally in the gas flow direction. The elongated gas flow channels include inlet channel(s) and outlet channel(a) arranged in an alternating manner, the inlet channel(s) configured receiving the gas flow at the inlet end and the outlet channel(s) outputting a filtered gas flow from the outlet end. Gas flow redirecting structures are arranged to redirect the gas flow in each inlet channel through adjacent panel filter(s) and into adjacent outlet channel(s). The filter may provide a pressure drop of less than 3 iwg, less than 1 iwg, or less than 0.3 iwg.

Filter for purifying an air stream

A process and device for enhancing the chemical protection capability of a collective protection filter whereby the process stream exiting the collective protection filter is passed through an Auxiliary Filter. The auxiliary filter containing an ammonia removal media, such as zirconium hydroxide impregnated with zinc chloride (ZnCl/Zr(OH)), an oxidizing media, preferably zirconium hydroxide impregnated with potassium permanganate (KMnO/Zr(OH)), and a methyl bromide removal media, preferably activated carbon impregnated with triethylenediamine (TEDA/carbon). The auxiliary filter and process are configured to remove toxic industrial chemicals including NH, NO(mixtures of NO and NO) and CHO, and CHBr.

Auxiliary filter for enhanced chemical protection

Growing community of inventors

Columbus, OH, United States of America

Mark Noltimier