Universal Display Corporation

Fei Comapny

Mark Meuwese

Sven Pekelder

Bart Buijsse

William E Quinn

Gregory McGraw

Gregg Kottas

Theodorus Hubertus Josephus Bisschops

Edwin Van Den Tillaart

Peter Van Putten

Maurits Willenbroek

Piet Van Rens

Hendrik Nicolaas Slingerland

Hendrik Gezinus Tappel

Sjoerd Antonius Maria Mentink

Maria Van Wely-Dieleman

Bernardus Jacobus Marie Bormans

Bernardus Bormans

A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.

Organic electroluminescent devices

A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head moveable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.

Actuation mechanism for accurately controlling distance in OVJP printing

Nozzle exit contours for pattern composition

A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.

The invention relates to an apparatus for evacuating samples. A sampleis hereby placed in a cavityof a sheetwith a smooth surface. A sole plateIs placed upon this smooth surface, whereby the smooth surfaceand the sole plateplaced thereupon together form a vacuum seal. The sole plate, upon which a vacuum columnis mounted, can be slid across the smooth surface. By sliding the sole plateover the cavity, the cavityis evacuated in several steps. In an embodiment of the invention, the vacuum columntakes the form of an ESEM (Environmental Scanning Electron Microscope). In this way, it is possible to inspect the evacuated samplewith the ESEM.

Apparatus for evacuating a sample

A cluster tool includes multiple tools for microscopic processing of a sample positioned around a rotatable base. A sample holder on the base rotates the sample between the working areas of the tools. A slidable vacuum seal maintains a vacuum in a sample chamber for tools that require a vacuum.

Cluster tool for microscopic processing of samples

The invention describes a particle-optical apparatus arranged to focus a beam () of electrically charged particles with the aid of two particle-optical lens systems (). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam () traverses the lens systems (). This can easily happen by altering the voltage of electrical power supplies ().

Apparatus with permanent magnetic lenses

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Eindhoven, Netherlands

Mark Meuwese