Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Mark Kroon

Marcus Adrianus Van De Kerkhof

Timotheus Franciscus Sengers

Erik Roelof Loopstra

Arie Jeffrey Den Boef

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Christiaan Alexander Hoogendam

Bob Streefkerk

Hans Butler

Jeroen Johannes Sophia Maria Mertens

Joost Jeroen Ottens

Joeri Lof

Helmar Van Santen

Alexander Straaijer

Klaus Simon

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Erik Theodorus Maria Bijlaart

Frank Van Schaik

Kees Van Weert

Aleksey Yurievich Kolesnychenko

Roelof Aeilko Siebrand Ritsema

Jan Evert Van Der Werf

Peter Dirksen

Michael Cornelis Van Beek

Vadim Yevgenyevich Banine

Ralph Kurt

Hans Van Der Laan

Wilhelmus Cornelis Keur

Cassandra May Owen

Johannes Hubertus Josephina Moors

Haico Victor Kok

Levinus Pieter Bakker

Jeroen Jonkers

Robertus Adrianus Maria Wolters

Theodorus Hubertus Josephus Bisschops

Johannes Adrianus Antonius Theodorus Dams

Carolus Ida Maria Antonius Spee

Harm-Jan Voorma

Casparus Anthonius Henricus Juffermans

Aleksey Yurievich Kolensnychenko

Adrianus Johannes Henricus Maas

Frits Jurgen Van Hout

Josephus Antonius Maria Van Bommel

Renatus Maria Adrianus Mathias Van Den Eijnden

Johannes H J Moors

Roelof Aeilko Siebranc Ritsema

Roelof Aeiko Siebrand Ritsema

Sjoerd Nicolaas Lamburtus Donders

A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid

An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

Lithographic apparatus and device manufacturing method involving a member and a fluid opening

An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.

Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap

A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.

Method of preparing components, prepared component, lithographic apparatus and device manufacturing method

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Utrecht, Netherlands

Mark Kroon