Asml Netherlands B.v.

Asml Holding N.v.

Mark Josef Schuster

Christopher Charles Ward

Daniel Nathan Burbank

Frank Johannes Jacobus Van Boxtel

Samir A Nayfeh

Justin Matthew Verdirame

Peter A Delmastro

Johannes Onvlee

Daniel Nicholas Galburt

Earl William Ebert

Abdullah Alikhan

Martinus Hendrikus Antonius Leenders

Jan Steven Christiaan Westerlaken

Erik Roelof Loopstra

Thibault Simon Mathieu Laurent

Ruud Hendrikus Martinus Johannes Bloks

Christiaan Louis Valentin

Franciscus Godefridus Casper Bijnen

Stephen Roux

Santiago E Del Puerto

Laurentius Johannes Adrianus Van Bokhoven

Koen Cuypers

Marinus Jan Remie

Robertus Nicodemus Jacobus Van Ballegoij

Jean-Philippe Xavier Van Damme

Arindam Sinharoy

Thomas Venturino

Marcelo Henrique De Andrade Oliveira

Chattarbir Singh

Henricus Anita Jozef Wilhemus Van De Ven

José Nilton Fonseca Junior

Peter James Graffeo

Duncan Harris

Duncan Walter Bromley

A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Lithographic apparatus

A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate () positioned between the movable stage () and the projection system (). The plate includes an opening () that comprises a first sidewall () and a second sidewall (). The plate may be configured to provide a gas flow pattern () in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Gas flow optimization in reticle stage environment

A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

Patterning device support, lithographic apparatus, and method of controlling patterning device temperature

A system () for supporting an exchangeable object () can include a movable structure () and an object holder () configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly () and second actuator assembly (). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

Patterning device manipulating system and lithographic apparatuses

A patterning device support (), for example, a patterning device () or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface () or an acoustic vibration generating interface (), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

Patterning device support and lithographic apparatus

A patterning device support () for controlling a temperature of a patterning device () can include a movable component (). The movable component can include a gas inlet () for supplying a gas flow across a surface of the patterning device and a gas outlet () for extracting the gas flow. The patterning device support can also include a gas flow generator () coupled to a duct () for recirculating the gas flow from the gas outlet to the gas inlet.

A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.

Real-time reticle curvature sensing

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Reticle cooling system in a lithographic apparatus

Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

Determining position and curvature information directly from a surface of a patterning device

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Fairfield, CT, United States of America

Mark Josef Schuster