Ahsoon Technologies, Inc.

Blue Control Technologies, Inc.

Mark Freeland

Sukesh Janubhai Patel

Ole D Krogh

Ali Sadeghi

Sukesh Patel

Systems and methods are provided that facilitate semiconductor processing, including etch processes. The invention provides real-time two-dimensional etch rate control. Prior to starting an etch process, a control model is selected that relates to the etch process. A formula or function description is developed from the model and solved to obtain process parameter values that are predicted to produce the desired etch rates. During the fabrication etch process, critical dimension measurements of a polysilicon gate are obtained. From these measurements, the etch process is modified so as to achieve a desired horizontal etch rate and a desired vertical etch rate. The etch process results in a polysilicon gate having a desired rectangular profile.

Method and apparatus for poly gate CD control

Systems and methodologies are provided that adapt and control desired fabrication processes by utilizing a control model based solution. A suitable control model is obtained or derived from one or more other control models. A formulaic description is then obtained that predicts one or more desired outputs based on various process settings and inputs. A suitable solution to the description that achieves the desired outputs and is relatively close to ideal processing conditions is obtained utilizing a heuristic. The solution includes process control parameters or settings that are employed to control and/or modify a fabrication process.

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San Francisco, CA, United States of America

Mark Freeland