Other

Texas Instruments Corporation

Florida Power & Light Company

Mark E Mason

Vytenis J Viltrakis

Nick L French

William R McKee

Clive D Bittlestone

Nagaraj Narasimh Savithri

Stephanie Watts Butler

Kenneth Michael Butler

Juan Morales

James D Hurst

Alma R Emerson

Steven D Carlson

Adrian Jesus Rego

Amit Grover

The present invention includes a method for sequencing a meter route. The method may include a step for adding routes or premises to a map. This step may be implemented as a user initiated action with the operator creating a new route based on preexisting routes as a starting point. The premises or existing routes may correspond to a particular zip code. In one embodiment, every premise may be tied to a route.

AMI visual routing

A clamp fixture for supporting a baseball type cap of the type having a crown portion and a brim portion that extends outwardly from the crown on an embroidery machine includes a brim band having a curvilplanar configuration to resiliently urge the bill of a cap out of the path of a embroidery machine head, and allows embroidery on the lower portion of the crown portion, adjacent to the brim portion.

Clamp fixture for embroidering a cap

A embroidery clamp for thick fabric includes a movable clamping window support that is pivotally connected to a frame and extends around a pivotal axis. An actuating system applies a force to the end of the clamping window support and rotates the support around to pivotal axis to move clamping windows together. The clamping window supports have resilient properties and are configured for flexure.

Clamp for embroidering thick fabrics

Systems and methods are provided for refining a design cycle for an integrated circuit. An integrated circuit design is generated. A plurality of non-critical paths within the integrated circuit design are identified. A set of at least one of the plurality of non-critical paths is modified to produce a modified design in which the sensitivity of each of the set of non-critical paths to at least one parameter is enhanced. Each parameter is either a design parameter or a process parameter. An integrated circuit is fabricated according to the modified design. The fabricated integrated circuit is evaluated to measure a set of timing data representing each of the plurality of non-critical paths. The value of the parameter is determined from the measured set of timing data.

Test method and system for characterizing and/or refining an IC design cycle

The present application is directed to a method of selectively positioning sub-resolution assist features (SRAF) in a photomask pattern for an interconnect. The method comprises determining if a first interconnect pattern option will result in improved circuit performance compared with a second interconnect pattern option, where the first option is designed to be formed with SRAF and the second option is designed to be formed without SRAF. If it is determined that the first option will result in improved circuit performance, the first pattern option is selected as a target pattern and one or more SRAF patterns are positioned to facilitate patterning of the first pattern option. If it is not determined that the first option will result in improved performance, the second pattern option is selected as a target pattern.

Method for positioning sub-resolution assist features

A low profile clamp for an embroidery machine uses resilient arms that function as a leaf spring to transmit compressive closing forces to secure articles to be embroidered between clamping windows. A roller is moved in an arcuate path to apply bending stresses to clamp arms. The low profile of the clamp allows it to pass between the presser feet and throat plate protecting the presser feet and needles from serious damage if the panagraph moves the body of the clamp in the space between presser feet and throat plate during machine initialization or at any other time.

Low profile clamp for embroidery machine

A fabric holder of the type that attaches to a carriage of an embroidery machine and positions an embroidery frame in position relative to an embroidery platform, including a base, and multiple fabric clamping frame sets, each of the clamping frame sets having a lower clamping member and an upper clamping member mounted for movement between a closed position and an open release position. The lower clamping member and the upper clamping member of a selected set are releasably attached to the fabric holder.

Fabric holder for embroidery frames

A system for varying the transmission of an attenuated phase shift mask ( ) is provided that includes an attenuated phase shift mask ( ), a transparent support ( ) and a modulation system ( ). The mask ( ) comprises a variable transmission material. The transparent support ( ) supports the mask ( ). The modulation system ( ) is operable to apply a variable force at the mask ( ) to control the transmission of the mask ( ).

Method and system for varying the transmission of an attenuated phase shift mask

A fabric frame holder for holding a fabric to be embroidered using automated embroidery equipment having a body portion, multiple sets of adaptor plates, and a multiple fabric mounting frames. The body portion has a central area for releasably receiving the fabric mounting frames, and a pair of attachment arms extending laterally to either side. The attachment arms terminate in attachment ends at which points one set of the adaptor plates, which correspond to the type of embroidery machine being utilized, are attached, and a selected fabric holding frames is mounted to the central body portion.

Fabric frame holder for embroidery

An interchangeable and manually operable embroidery frame for holding an article to be embroidered using automated embroidery equipment having a base plate, and upper clamping member pivotally connected to the base plate, a clamping mechanism for biasing the upper clamping member in closed contact with the base, mounting arms extending outwardly from the base plate, and selectively removable adapters attached to each mounting arm, whereby the adapters enable the clamping frame to be mounted on a selected automated embroidery machine.

Growing community of inventors

Hamilton, OH, United States of America

Mark E Mason