H.c. Starck Gmbh

Duracell Inc.

H.c. Starck Solutions Euclid, LLC

H.c. Stark Inc.

Mark E Gaydos

Gary Alan Rozak

Steven Alfred Miller

Shuwei Sun

Patrick Hogan

Stefan Zimmermann

Scott Jeffrey Volchko

William Loewenthal

Prabhat Kumar

Leonid Natan Shekhter

Gokce Gulsoy

Christopher A Michaluk

Francois-Charles Dary

Rong-Chein Richard Wu

Norman C Mills

Steve Miller

Michael Thomas Stawovy

Philip D Trainer

Weifang Luo

Patrick Alan Hogan

John A Shields

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.

Molybdenum containing targets

A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being essentially free of any visible joint line the target that is greater than about 200 &#x3bc;m width (e.g., less than about 50 &#x3bc;m width). A process for making the target includes hot isostatically pressing, below a temperature of 1080&#xb0; C., consolidated perform blocks that may be surface prepared (e.g., roughened to a predetermined roughness value) prior to pressing.

Multi-block sputtering target and associated methods and articles

A sputtering target that includes at least two consolidated blocks, each block including an alloy including a first metal (e.g., a refractory metal such as molybdenum in an amount greater than about 30 percent by weight) and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being prepared free of any microstructure derived from a diffusion bond of an added loose powder. A process for making the target includes hot isostatically pressing (e.g., below a temperature of 1080&#xb0; C.), consolidated preform blocks that, prior to pressing, have interposed between the consolidated powder metal blocks at least one continuous solid interface portion. The at least one continuous solid interface portion may include a cold spray body, which may be a mass of cold spray deposited powders on a surface a block, a sintered preform, a compacted powder body (e.g., a tile), or any combination thereof.

Multi-block sputtering target with interface portions and associated methods and articles

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.

Touch screen device comprising Mo-based film layer and methods thereof

Molybdenum containing targets for touch screen device

In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.

Methods of manufacturing large-area sputtering targets using interlocking joints

Large-area sputtering targets

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Nashua, NH, United States of America

Mark E Gaydos