Asml Netherlands B.v.

Asml Holding N.v.

Mark Constant Johannes Baggen

Niek Jacobus Johannes Roset

Siegfried Alexander Tromp

Marcus Martinus Petrus Adrianus Vermeulen

Abraham Alexander Soethoudt

Gijs Kramer

Antonie Hendrik Verweij

Frank Pieter Albert Van Den Berkmortel

Simon Karel Ravensbergen

Jan Pieter Van De Poel

Roger Anton Marie Timmermans

Marcel François Heertjes

Ramidin Izair Kamidi

Michael Johannes Vervoordeldonk

Arie Jeffrey Den Boef

Hans Butler

Nicolaas Rudolf Kemper

Engelbertus Antonius Fransiscus Van Der Pasch

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Marc Wilhelmus Maria Van Der Wijst

Emiel Jozef Melanie Eussen

Frank Johannes Jacobus Van Boxtel

Marcel Koenraad Marie Baggen

Jeroen Pieter Starreveld

Günes Nakiboglu

Stefan Geerte Kruijswijk

Richard Carl Zimmerman

Martinus Van Duijnhoven

Sander Kerssemakers

Ronald Casper Kunst

Jeroen Arnoldus Leonardus Johannes Raaymakers

Robertus Mathijs Gerardus Rijs

Petrus Marinus Christianus Maria Van Den Biggelaar

Hendrikus Herman Marie Cox

Yin Tim Tso

Benjamin Cunnegonda Henricus Smeets

Dennis Andreas Petrus Hubertina Houben

Marinus Jacobus Gerardus Van De Molengraft

Gerard Johannes Boogaard

Erwin Antonius Henricus Franciscus Van Den Boogaert

Jessica Henrica Anna Verdonschot

Constant Paul Marie Jozef Baggen

A metrology tool that includes a substrate table to hold a substrate; a projection system configured to project a beam on a target portion of the substrate; an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

Metrology tool with position control of projection system

A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

Substrate holder for use in a lithographic apparatus

A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method

A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.

Lithographic apparatus and method

A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.

A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber () in communication with the compartment and a perforated plate (), having a plurality of through-holes (), between the chamber and the compartment.

Lithographic apparatus

A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

Lithographic apparatus and stage system

A position control system configured to control the position of a movable object, includes: a position measurement system configured to determine a position of a sensor or sensor target on the movable object, a comparator configured to provide an error signal by comparing a set-point position and a position feed-back signal based on the measured position, a controller to provide a control signal based on the error signal, a feed-forward device to provide a feed-forward signal on the basis of a first signal related to the desired position, and one or more actuators configured to act on the movable object based on the control signal and the feed-forward signal, wherein the position control system further includes a compliance compensation device providing a compliance compensation signal, wherein the compliance compensation signal is subtracted from a measured position of the position measurement system to obtain the feed-back position signal.

Position control system, a lithographic apparatus and a method for controlling a position of a movable object

A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.

Stage system and lithographic apparatus comprising such stage system

In a lithographic apparatus, a feedforward transfer function of a control system is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.

Lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Mark Constant Johannes Baggen