Taiwan Semiconductor Manufacturing Comp. Ltd.

Mark Chien

Chin-Hsiang Lin

Hsin-Chang Lee

Anthony Yen

Yun-Yue Lin

Chih-Cheng Lin

Yao-Ching Ku

Wei-Jen Lo

Hsuan-Chen Chen

A method for fabricating a pellicle includes forming a first dielectric layer over a back surface of a substrate. After forming the first dielectric layer, and in some embodiments, a graphene layer is formed over a front surface of the substrate. In some examples, after forming the graphene layer, the first dielectric layer is patterned to form an opening in the first dielectric layer that exposes a portion of the back surface of the substrate. Thereafter, while using the patterned first dielectric layer as a mask, an etching process may be performed to the back surface of the substrate to form a pellicle having a pellicle membrane that includes the graphene layer.

Pellicle fabrication methods and structures thereof

Growing community of inventors

Taipei, Taiwan

Mark Chien