Lucent Technologies Inc.

At&t Bell Laboratories

Mark Anthony Cappuzzo

Joseph Shmulovich

Louis T Gomez

Greg E Blonder

Yiu-Huen Wong

Ronald Edward Scotti

Harold R Clark

Christopher Richard Doerr

John VanAtta Gates

Dirk Joachim Muehlner

Gerard Edmond Henein

Louis Nelson Ahlquist

Isaac Ryazansky

Casey Francis Kane

Judith Martin Szalkowski

John Van Atta Gates, Ii

A compact laser package having a submount with a plurality of electrical contact pads and a plurality of electrical connection lines formed thereon. The submount may be configured to receive at least one optical component thereon, the at least one optical component being in electrical communication with at least one of the plurality of electrical connection lines. A lid is provided, the lid having a recessed portion and a groove formed therein, the recessed portion being positioned in an interior of the lid and the groove being positioned to intersect the recessed portion and a peripheral edge of the lid. The submount is generally configured to cooperatively engage the lid to form a hermetically sealed laser package.

Laser package

The specification describes thermo-optically controlled waveguides where the thermo-optic control is a heater strip precisely aligned to the waveguide core by using the heater strip as an etch mask to define at least part of the core/upper cladding structure. In one embodiment the heater strip mask is larger than the underlying waveguide core so as to produce, on etching, a core surrounded with a minimum of cladding material on the sidewalls of the core, and a confined heat channel between the waveguide core and the heater strip. In a second embodiment the heater strip is used as an etch mask to define a core cladding stack, and a third cladding layer is deposited to clad the sidewalls of the core. In this embodiment, the cladding material in the stack can be optimized for thermal conductivity, and the third cladding material can be optimized for thermo-optic sensitivity.

Tunable optical waveguides

The specification describes wafer fabrication cleaning processes for silicon optical bench technology. The cleaning processes are designed to remove debris in situ after dicing silicon wafers mounted on a tape carrier. They were also developed specifically to avoid staining and residues that often result from using standard dicing approaches in silicon optical bench integrated circuit manufacture.

Process for the manufacture of optical integrated circuits

In accordance with a specific deposition/etching sequence, a multi-layer metallization system is formed on the non-planar top surface of a semiconductor wafer. In an electrophoretic deposition step, a conformal uniform-thickness layer of a resist material is then formed on the top surface of the metallization system. In turn, the layer of resist material is lithographically patterned to provide an etch-mask for defining features in the underlying metallization system.

Method of making semiconductor devices by patterning a wafer having a

A turning mirror in an optical waveguide structure is made by etching in the upper surface of the structure a cavity (18) that intercepts the path of light propagated by the waveguide (15, 16, 13). Preferably, the cavity is made to be asymmetric with the side (25) of the cavity remote from the waveguide sloping at typically a forty-five degree angle. The asymmetry can be introduced by using mask and etch techniques and treating the surface of the structure such that the etchant undercuts the mask on the side of the cavity remote from the waveguide to a greater extent than it undercuts the mask on the side of the cavity adjacent the waveguide.

Optical waveguide structure including reflective asymmetric cavity

Methods for making mirrors

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Succasunna, NJ, United States of America

Mark Anthony Cappuzzo