Viavi Solutions Inc.

Jds Uniphase Corporation

Marius Grigonis

Georg J Ockenfuss

Karen Denise Hendrix

Richard Alan Bradley, Jr

Jinhui Yang

Scott Rowlands

Markus K Tilsch

Tim Gustafson

Andrew Clark

Andy Shkabko

Joseph Stork Smith

Adam Preuss

Anthony Jay Kemp Cottrell

Nicolas Alexander Davis

Neil Pinkerton

Eric Nybank

Yinxiang Xia

Donggong Peng

Zhao Yuan

An optical filter may include a set of optical filter layers disposed onto a substrate. The set of optical filter layers may include a first subset of optical filter layers comprising a first material with a first refractive index. The first material may comprise at least silicon and hydrogen. The set of optical filter layers may include a second subset of optical filter layers comprising a second material with a second refractive index. The second material is different from the first material and the second refractive index is less than the first refractive index. The set of optical filter layers may include a third subset of optical filter layers comprising a third material different from the first material and the second material.

Optical filter

An optical interference filter includes one or more sets of layers. Each set of layers includes a first layer that includes at least aluminum and nitrogen (e.g., an aluminum nitride (AlN) material), a second layer that includes at least silicon and oxygen (e.g., a silicon dioxide (SiO) material), and a third layer that includes at least hydrogen and silicon (e.g., a hydrogenated silicon (Si:H) material). The second layer is disposed between the first layer and the third layer.

Optical interference filter

In some implementations, an optical interference filter includes a substrate and one or more sets of layers that are disposed on the substrate. Each set of layers includes: a first layer that comprises at least tantalum and oxygen (e.g., a tantalum pentoxide (Ta2O5) material); a second layer that comprises at least aluminum and nitrogen (e.g., an aluminum nitride (AlN) material); and a third layer that comprises at least hydrogen and silicon (e.g., a hydrogenated silicon (Si:H) material). The second layer is disposed between the first layer and the third layer. In some implementations, a first surface of the second layer is disposed on a surface of the first layer, and a second surface of the second layer is disposed on a surface of the third layer.

In some implementations, an optical interference filter includes a substrate; and a set of layers that are disposed on the substrate, wherein the set of layers includes: a first subset of layers; and a second subset of layers; wherein: each of the first subset of layers includes an aluminum nitride (AlN) material, a stress of each of the first subset of layers is between −1000 and 800 megapascals, the first subset of layers has a first refractive index with a first value, each of the second subset of layers includes at least one other material, the second subset of layers has a second refractive index with a second value that is different than the first value, and the optical interference filter has an effective refractive index greater than or equal to 95% of a highest value of the first value and the second value.

Optical interference filter with aluminum nitride layers

An optical filter having a passband at least partially overlapping with a wavelength range of 800 nm to 1100 nm is provided. The optical filter includes a filter stack formed of hydrogenated silicon layers and lower-refractive index layers stacked in alternation. The hydrogenated silicon layers each have a refractive index of greater than 3 over the wavelength range of 800 mn to 1100 nm and an extinction coefficient of less than 0.0005 over the wavelength range of 800 nm to 1100 nm.

Optical filter and sensor system

In some implementations, an optical interference filter includes a substrate; and a set of layers that are disposed on the substrate. The set of layers includes a first subset of layers, wherein the first subset of layers comprises an aluminum nitride (AlN) material; and a second subset of layers, wherein the second subset of layers comprises a hydrogenated silicon (Si:H) material.

A device may include one or more memories and one or more processors, communicatively coupled to the one or more memories, to receive design information, wherein the design information identifies desired values for a set of layers of an optical element to be generated during one or more runs; receive or obtain historic information identifying a relationship between a parameter for the one or more runs and an observed value relating to the one or more runs or the optical element; determine layer information for the one or more runs based on the historic information, wherein the layer information identifies run parameters, for the set of layers, to achieve the desired values; and cause the one or more runs to be performed based on the layer information.

Coating control using forward parameter correction and adapted reverse engineering

A device including a hard shield material; a layer including aluminum or copper; and a silicon layer having a first thickness is disclosed. The device can also include a silicon layer having a second thickness. A method of making the device is also disclosed.

Silicon coating on hard shields

An optical filter having a passband at least partially overlapping with a wavelength range of 800 nm to 1100 nm is provided. The optical filter includes a filter stack formed of hydrogenated silicon layers and lower-refractive index layers stacked in alternation. The hydrogenated silicon layers each have a refractive index of greater than 3 over the wavelength range of 800 nm to 1100 nm and an extinction coefficient of less than 0.0005 over the wavelength range of 800 nm to 1100 nm.

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Santa Rosa, CA, United States of America

Marius Grigonis