University System of Maryland

Quantum Photonics Corporation

Thorlabs Quantum Electronics, Inc.

Covega Corporation

Other

Quan Photonics, Inc

Mario Dagenais

Peter J S Heim

Simarjeet S Saini

Scott A Merritt

Jerry L Bowser

Vincent K Luciani

Martin C Peckerar

Yves T Ngu

Birendra Dutt

Bikash Koley

Peter John Heim

Ryan Enck

John D Barry

Michael D Messina, Jr

Yang Zhang

Frederick Gorr Johnson

Anthony W Yu

Stewart W Wilson

Madhumita Datta

Gregg Switzer

Peter John Schultz Heim

Robert Ernest Bartolo

Vijayanand Vusirikala

I-Fan Wu

Xun Li

A laser system for generating a narrow linewidth semiconductor light beam includes a substrate, a gain chip affixed on the substrate and configured to amplify light beam, and an optical feedback photonic chip affixed on the substrate, optically coupled to the gain chip, and configured to output light beam, which has a narrow linewidth around a resonant frequency of the optical feedback photonic chip, to the gain chip.

High power, narrow linewidth semiconductor laser system and method of fabrication

A laser system for generating a narrow linewidth semiconductor light beam includes a substrate, a gain chip affixed on the substrate and configured to amplify light beam, and an optical feedback photonic chip affixed on the substrate, optically coupled to the gain chip, and configured to output light beam, which has a narrow linewidth around a resonant frequency of the optical feedback photonic chip, to the gain chip. The optical feedback photonic chip includes first and second optical gratings, a first multimode interferometer (MMI) and a second MMI optically coupled with a respective end of the first and second optical gratings, a third MMI configured to output two light beams to the first and second MMIs, respectively, through a respective waveguide. Based on receiving a respective one of the two light beams, the first MMI outputs two light beams to its respective end of the first and second optical gratings and the second MMI outputs two light beams to its respective end of the first and second optical gratings, the first and second optical gratings output second and third light beams, the second light beam, of which a linewidth is narrower than a linewidth of the third light beam, is directed to the third MMI, and an output port of the third MMI is configured to direct the second light beam to the gain chip.

A semiconductor optical amplifier (SOA) with efficient current injection is described. Injection current density is controlled to be higher in some areas and lower in others to provide, e.g., improved saturation power and/or noise figure. Controlled injection current can be accomplished by varying the resistivity of the current injection electrode. This, in turn, can be accomplished by patterning openings in the dielectric layer above the current injection metallization in a manner which varies the series resistance along the length of the device.

Semiconductor optical amplifier having a non-uniform injection current density

A nanophotolithography mask includes a layer of an electrically conductive optically opaque material deposited on a mask substrate in which regular arrays of sub-wavelength apertures are formed. The plasmonic excitation in the layer perforated with the sub-wavelength apertures arrays under the light incident on the mask produces high resolution far-field radiation patterns of sufficient intensity to expose a photoresist on a wafer when propagated to the same. The fill-factor of the mask, i.e., the ratio of the total apertures area to the total mask area, may lead to a significant increase in mask manufacturing throughput by FIB or electron beam 'writing'. The mask demonstrates the defect resiliency and ability to imprint coherent clear features of nano dimensions and shapes on the wafers for integrated circuits design.

Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography

A stepper system for ultra-high resolution nano-lithography employs a photolithographic mask which includes a layer of an electrically conductive optically opaque material in which periodic arrays of sub-wavelength apertures are formed. The plasmonic excitation in the photolithographic mask exposed to the light of the wavelength in the range of 197 nm-248 nm, produces high resolution far-field radiation patterns of sufficient intensity to expose a photoresist on a wafer. The stepper system demonstrates the resiliency to the mask defects and ability to imprint coherent clear features of nano dimensions (45 nm-500 nm) and various shapes on the wafers for integrated circuits design. The stepper system may be adjusted to image the plane of the highest plasmonic field exiting the mask.

Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays

Semiconductor devices having various combinations of curved waveguides and mode transformers are described. According to some exemplary embodiments, the mode transformer itself can be fabricated as all or part of the curved waveguide. For these exemplary embodiments it can be beneficial to use mode transformers whose active regions are relatively small to minimize losses associated with the introduced curvature, e.g., mode transformers that employ resonantly coupled waveguides and a tapered active waveguide in the mode transformation region. According to other exemplary embodiments, the mode transformer can be disposed along a straight portion of the waveguide, e.g., between the curved portion of the waveguide and the back facet. The present invention also provides flexibility in manufacturing by permitting different types of devices to be generated from a wafer depending upon where the devices are cleaved.

Semiconductor devices with curved waveguides and mode transformers

A semiconductor optical amplifier (SOA) has an overall gain that is substantially polarization independent, i.e., less than 1 dB difference between transverse electric (TE) and transverse magnetic (TM) gain. The SOA includes a residual cladding layer having different thicknesses over different portions of the gain section. Over a first portion of the gain section, the residual cladding layer is thinner than over a second portion of the gain section. This results in the first portion providing more gain to optical energy having a TE polarization state than optical energy having a TM polarization state. In the second portion of the gain section, however, more gain is provided to optical energy having a TM polarization state than energy having a TE polarization state. The resulting gain differences can be designed to offset one another so that the output has a gain that is substantially polarization independent.

Low polarization gain dependent semiconductor optical amplifier with variable residual cladding layer thickness

A semiconductor optical amplifier (SOA) has an overall gain that is substantially polarization independent, i.e., less than 1 dB difference between transverse electric (TE) and transverse magnetic (TM) gain. The SOA includes gain and polarization rotation functions integrated onto a single substrate. According to one exemplary embodiment, a passive polarization rotation section is disposed between two active gain sections.

Semiconductor optical amplifier with low polarization gain dependency

An optical amplification device includes a depolarizer for reducing the polarization sensitivity requirements on an SOA by changing the input to the SOA from having an arbitrary (unknown) polarization state to a known (depolarized) state. The depolarizer receives an input optical signal and outputs a depolarized, optical signal, and a semiconductor optical amplifier (SOA) receives the depolarized optical signal and outputs an amplified optical signal.

Methods and devices for amplifying optical signals using a depolarizer

A method of selectively oxidizing III-V semiconductor material is provided. There is provided a III-V semiconductor system comprising a short-period super lattice (SSL) of N periods of alternating layers of an aluminum-bearing III-V compound semiconductor material and a second III-V semiconductor material where N&gE;2, at least one phosphorous-rich III-V semiconductor layer, and at least one substantially phosphorous-free III-V semiconductor layer between each of the at least one phosphorous-rich layers and the SSL. The III-V semiconductor system is exposed to oxidizing atmosphere to selectively oxidize at least a portion of the SSL.

Method of efficient controllable and repeatable wet oxidation in a phosphorous-rich III-V material system

A electroless plating method re-metallizes aluminum bond pads so that the re-metallized bond pads include layers of aluminum, zinc, nickel, and gold. The re-metallized bond pads are wire-bondable and solder wettable, and therefore can be flip-chip bonded. Applications include the realization of hybrid smart pixel arrays for optical interconnections, where an optical transmitter and optical detector are flip-chip bonded directly to respective CMOS driver chips.

Re-metallized aluminum bond pad, and method for making the same

A cavity-less vertical semiconductor optical amplifier is provided which includes an active region of an intrinsic bulk semiconductor material sandwiched between p- and n-layers of semiconductor materials in which a vertical gain channel of a predetermined confined cross-sectional configuration is formed to constitute an amplification region of the optical amplifier. The amplification region is sandwiched between layers of p- and n-doped layers of linearly graded semiconductor material supplying holes and electrons to the active region upon switching &ldquo;ON&rdquo; of the optical amplifier. Several factors contribute to substantial amplification of an optical signal at a relatively low injection current which include a relatively long active region allowing sufficient single pass gain as well as a strictly confined cross-sectional configuration of the vertical gain channel which reduces the active volume of the amplification region resulting in substantially high gain at a relatively low current. Flattening of the conduction band and valence band profiles allows easy access of the holes and electrons into the active region. The cavity-less vertical semiconductor optical amplifier of the present invention is intended for multidimensional architectural structures for high speed communication.

Cavity-less vertical semiconductor optical amplifier

The output optical beam from an angled-facet semiconductor laser diode is made to propagate parallel to the optical axis of the laser package with low optical back-reflection. In this way, the angled-facet devices are made compatible with conventional semiconductor laser packages enabling them to be economically incorporated in a wide-range of external semiconductor lasers and amplified spontaneous emission sources. The parallel beam is achieved by tilting the laser diode with respect to the front and back surfaces of the package.

Growing community of inventors

Chevy Chase, MD, United States of America

Mario Dagenais