Asml Netherlands B.v.

Asml Holding N.v.

Marinus Jan Remie

Johan Gertrudis Cornelis Kunnen

Johannes Henricus Wilhelmus Jacobs

Thibault Simon Mathieu Laurent

Nicolaas Ten Kate

Joost Jeroen Ottens

Ruud Hendrikus Martinus Johannes Bloks

Robbert Jan Voogd

Bastiaan Andreas Wilhelmus Hubertus Knarren

Giovanni Francisco Nino

Ronald Van Der Ham

Martijn Houben

Laurentius Johannes Adrianus Van Bokhoven

Sander Catharina Reinier Derks

Ivo Adam Johannes Thomas

Gerben Pieterse

Gregory Martin Mason Corcoran

Pieter Lein Joseph Gunter

Coen Cornelis Wilhelmus Verspaget

Günes Nakiboglu

Erik Roelof Loopstra

Johannes Onvlee

Frank Johannes Jacobus Van Boxtel

Jan Steven Christiaan Westerlaken

Christopher Charles Ward

Daniel Nathan Burbank

Koen Cuypers

Mark Josef Schuster

Robertus Nicodemus Jacobus Van Ballegoij

Marcelo Henrique De Andrade Oliveira

Chattarbir Singh

Henricus Anita Jozef Wilhemus Van De Ven

José Nilton Fonseca Junior

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

Patterning device cooling apparatus

A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate () positioned between the movable stage () and the projection system (). The plate includes an opening () that comprises a first sidewall () and a second sidewall (). The plate may be configured to provide a gas flow pattern () in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Gas flow optimization in reticle stage environment

Growing community of inventors

Eindhoven, Netherlands

Marinus Jan Remie