Asml Netherlands B.v.

Marijn Wouters

Erik Henricus Egidius Catharina Eummelen

Giovanni Luca Gattobigio

Yuri Johannes Gabriël Van De Vijver

Ferdy Migchelbrink

Gheorghe Tanasa

Arnoldus Johannes Martinus Jozeph Ras

Jimmy Matheus Wilhelmus Van De Winkel

Norbertus Josephus Martinus Van Den Nieuwelaar

Jorge Alberto Vieyra Salas

Miao Yu

Bert Dirk Scholten

Daan Daniel Johannes Antonius Van Sommeren

Jeroen Arnoldus Leonardus Johannes Raaymakers

Victor Manuel Blanco Carballo

Pieter Lein Joseph Gunter

Harold Sebastiaan Buddenberg

Ronald Frank Kox

Floor Lodewijk Keukens

Frederik Antonius Van Der Zanden

Petrus Martinus Gerardus Johannes Arts

David Merritt Phillips

Casper Roderik De Groot

Seerwan Saeed

Rolf Hendrikus Jacobus Custers

An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Inspection substrate and an inspection method

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

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Utrecht, Netherlands

Marijn Wouters