Asml Netherlands B.v.

Carl-Zeiss-Smt Ag

Maria Johanna Agnes Rubingh

Jozef Maria Finders

Laurentius Cornelius De Winter

Erik Roelof Loopstra

Bernhard Geuppert

Franz Sorg

Bernardus Antonius Johannes Luttikhuis

Siebe Landheer

Laurentius Catrinus Jorritsma

Johannes Wilhelmus De Klerk

Adrianus Franciscus Petrus Engelen

Peter Deufel

Gerald Richter

Aart Adrianus Van Beuzekom

Bastiaan Stephanus Hendricus Jansen

Johannes Martinus Andreas Hazenberg

Peter Schaap

Dieter Schmerek

Joachim Schroeder

Petrus Franciscus Wilhelmus Maria Mandigers

Uwe Schubert

Willem Van Schaik

A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a beam of radiation. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the beam of radiation passes through the conduit and the fluid flowing through it. The beam modifying apparatus further comprises a heat exchanger in thermal communication with a portion of the conduit located upstream, having regard to the direction of the fluid flow, of the location at which the beam of radiation passes through the conduit.

Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus

A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

Lithographic apparatus, device manufacturing method and exchangeable optical element

A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectrum, constructing a merit function for a wavefront in a pupil plane of the projection system with the settings of the adjustable elements as variables with reference to the symmetry, and optimizing the merit function.

Device manufacturing method, computer program product and lithographic apparatus

A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectrum, constructing a merit function for a wave-front in a pupil plane of the projection system with the settings of the adjustable elements as variables with reference to the symmetry, and optimizing the merit function.

In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.

System for flushing at least one internal space of an objective

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Eindhoven, Netherlands

Maria Johanna Agnes Rubingh