Semiconductor Energy Laboratory Co., Ltd.

Mari Tateishi

Kensuke Yoshizumi

Natsuko Takase

Satoru Idojiri

Masataka Sato

Kayo Kumakura

Junpei Yanaka

Daisuke Kubota

Yuji Iwaki

To provide a peeling method that achieves low cost and high mass productivity. The peeling method includes the steps of: forming a first layer with a photosensitive material over a formation substrate; forming a first region and a second region having a smaller thickness than the first region in the first layer by photolithography to form a resin layer having the first region and the second region; forming a transistor including an oxide semiconductor in a channel formation region over the first region in the resin layer; forming a conductive layer over the second region in the resin layer; and irradiating the resin layer with laser light to separate the transistor and the formation substrate.

Peeling method, display device, module, and electronic device

A highly reliable display device is provided. The display device includes a first substrate, a first resin layer over the first substrate, a pixel portion and a terminal portion over the first resin layer, a second resin layer over the terminal portion, and a second substrate over the second resin layer. The pixel portion includes a transistor and a display element electrically connected to the transistor. The terminal portion includes a conductive layer. The first resin layer includes an opening. The conductive layer includes a first region that is exposed in the opening in the first resin layer. The second resin layer includes a region overlapping with the first region. The conductive layer is the same layer as at least one of a gate of the transistor and a source and a drain of the transistor.

Display device

Growing community of inventors

Ebina, Japan

Mari Tateishi