Tokyo Ohka Kogyo Co., Ltd.

Mari Murata

Masatoshi Arai

Nobuhiro Michibayashi

Yoshitaka Komuro

Takahiro Kojima

Yasuhiro Yoshii

Yoichi Hori

Takuya Ikeda

KhanhTin Nguyen

Hiroto Yamazaki

Yosuke Suzuki

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mrepresents an m-valent organic cation, Rrepresents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of 'n+p≤(q×2)+5' is satisfied.

Resist composition, method of forming resist pattern, and compound

A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rdrepresents a monovalent organic group and Rdrepresents a single bond or a divalent linking group

Resist composition and method of forming resist pattern

A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, the entire anion moiety may be an n-valent anion, and Mrepresents an m-valent organic cation 

Resist composition, and method of forming resist pattern

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Kawasaki, Japan

Mari Murata