Asml Netherlands B.v.

Marcus Joseph Elisabeth Godfried Breukers

Hans Butler

Marcel François Heertjes

Evert Hendrik Jan Draaijer

Martijn Houkes

Martinus Agnes Willem Cuijpers

Niels Johannes Maria Bosch

Menno Fien

Edwin Teunis Van Donkelaar

A control device configured to determine a primary first drive signal, based on a first error signal representing a difference between desired and measured positions of a first body, for driving a positioner driving the first body; determine a primary second drive signal, based on a second error signal representing a difference between desired and measured positions of a second body, for driving a positioner driving the second body; determine, based on the second error signal, a secondary first drive signal for driving the first body positioner; determine, based on the first error signal, a secondary second drive signal for driving the second body positioner; combine the primary and secondary first drive signals and combine the primary and secondary second drive signals; and output the combined first and second drive signals to the respective positioning devices.

Lithographic apparatus and device manufacturing method

A lithographic apparatus comprises an object table for receiving an object, an actuator for moving the object table and a handler for transferring the object to or from the object table. The apparatus is provided with a controller operable connected with the actuator and/or the handler. The controller is programmed and/or arranged to drive the actuator and the handler so as to provide that the object table and the handler substantially follow each other in a direction perpendicular to a transfer direction during transfer in the transfer direction of the object to or from the object table.

A control system to control a position of a substrate table for a lithographic apparatus, including: a first detection device to generate a position signal representative of the position of the projection system, a second detection device to generate a projection system feed-forward signal, a comparative unit to generate a servo error signal by subtracting a signal representative of an actual substrate table position from a substrate table position reference signal and adding the projection system position signal, a control unit to generate a first control signal on the basis of the servo error signal, an addition unit to generate a second control signal by adding the feed-forward signal and the first control signal, and an actuator unit to actuate the substrate table to a desired substrate table position on the basis of the second control signal. The control system further includes a projection system position signal filter unit.

Lithographic apparatus, projection apparatus and device manufacturing method

A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.

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Eindhoven, Netherlands

Marcus Joseph Elisabeth Godfried Breukers