Asml Netherlands B.v.

Marcus Johannes Van Der Zanden

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Paulus Martinus Maria Liebregts

Rogier Hendrikus Magdalena Cortie

David Bessems

Danny Maria Hubertus Philips

Jimmy Matheus Wilhelmus Van De Winkel

Pieter Mulder

Gert-Jan Gerardus Johannes Thomas Brands

Paul Willems

Nicolaas Rudolf Kemper

Johannes Henricus Wilhelmus Jacobs

Marco Koert Stavenga

Richard Joseph Bruls

Ronald Van Der Ham

Koen Steffens

Giovanni Luca Gattobigio

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Youri Johannes Laurentius Maria Van Dommelen

Daniel Jozef Maria Direcks

Paul Petrus Joannes Berkvens

Jorge Alberto Vieyra Salas

Jan Cornelis Van Der Hoeven

Clemens Johannes Gerardus Van Den Dungen

Rudy Jan Maria Pellens

Maikel Adrianus Cornelis Schepers

Coen Cornelis Wilhelmus Verspaget

Ronald Frank Kox

David Lucien Anstotz

Daniël Jozef Maria Direcks

Vijay Kumar Badam

Casper Roderik De Groot

Thijs Egidius Johannes Knaapen

Rudolf Adrianus Joannes Maas

Pieter Jeroen Johan Emanuel Hoefnagels

Maarten Marinus Van Oene

Martijn Hendrik Kamphuis

A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.

Device manufacturing method and computer program

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

Lithographic apparatus and device manufacturing method

A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

Fluid handling structure, lithographic apparatus and a device manufacturing method

An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

Immersion lithographic apparatus and device manufacturing method

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Boekel, Netherlands

Marcus Johannes Van Der Zanden